SCHEMBL896787

SCHEMBL896787

O=C(OC(=O)c1ccco1)c1ccco1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.62
CES1 P23141 1/20 0.62
KMT2A Q03164 12/20 0.62
PTPN1 P18031 2/20 0.56
ALDH1A1 P00352 4/20 0.55
HSD17B10 Q99714 3/20 0.55
PTPN2 P17706 1/20 0.55
PTPN6 P29350 1/20 0.55
PTPN11 Q06124 1/20 0.55
POLB P06746 2/20 0.54
MEN1 O00255 1/20 0.54
THRB P10828 1/20 0.54
APEX1 P27695 1/20 0.54
RECQL P46063 1/20 0.54
TDP1 Q9NUW8 1/20 0.54
PKM P14618 2/20 0.51
SMN1; SMN2 Q16637 1/20 0.51
TSHR P16473 2/20 0.50
MAPT P10636 2/20 0.49
KDM4E B2RXH2 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28297982 0.92 KMT2A (0.55) CES2CES1KMT2APTPN1ALDH1A1
SCHEMBL28278771 0.91 KMT2A (0.58) CES2CES1KMT2APTPN1ALDH1A1
SCHEMBL7746320 0.88 SMN1; SMN2 (0.59) CES2CES1KMT2APTPN1ALDH1A1
SCHEMBL584513 0.87 KMT2A (0.56) CES2CES1KMT2APTPN1ALDH1A1
SCHEMBL2201261 0.86 CES2 (0.62) CES2CES1KMT2APTPN1ALDH1A1
Potassium Ion SCHEMBL28875571 0.86 KMT2A (0.53) CES2CES1KMT2APTPN1ALDH1A1
SCHEMBL28247508 0.86 KMT2A (0.53) CES2CES1KMT2APTPN1ALDH1A1
SCHEMBL28275168 0.86 KMT2A (0.53) CES2CES1KMT2APTPN1ALDH1A1
SCHEMBL28201534 0.86 KMT2A (0.54) CES2CES1KMT2APTPN1ALDH1A1
SCHEMBL29120288 0.84 KMT2A (0.57) CES2CES1KMT2APTPN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122037740-A High-performance multi-component composite bio-based powder coating and preparation method thereof 成都信达高分子材料有限公司 2026-05-15 CN claimed
WO-2025105347-A1 COMPOSITION, METHOD FOR PRODUCING FLUTICASONE FURANCARBOXYLIC ACID ESTER, METHOD FOR PURIFYING FLUTICASONE FURANCARBOXYLIC ACID ESTER, AND METHOD FOR PRODUCING LABELED COMPOUND アルプス薬品工業株式会社 2025-05-22 WO claimed
CN-111830786-B Photosensitive resin composition containing silane coupling agent 波米科技有限公司 2023-05-23 CN claimed
CN-122037740-A High-performance multi-component composite bio-based powder coating and preparation method thereof 成都信达高分子材料有限公司 2026-05-15 CN disclosed
CN-122011364-A Fluorescent nylon material and preparation method and application thereof 中国石油化工股份有限公司 2026-05-12 CN disclosed
WO-2025105347-A1 COMPOSITION, METHOD FOR PRODUCING FLUTICASONE FURANCARBOXYLIC ACID ESTER, METHOD FOR PURIFYING FLUTICASONE FURANCARBOXYLIC ACID ESTER, AND METHOD FOR PRODUCING LABELED COMPOUND アルプス薬品工業株式会社 2025-05-22 WO disclosed
US-20240367156-A1 IRON-COBALT-BASED MAGNETICALLY RECOVERABLE CATALYSTS AND METHOD OF PREPARATION THEREOF KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS (SA) 2024-11-07 US disclosed
CN-115322353-B Method for preparing alternating polyester and block polyester by copolymerization of metal-free catalytic epoxy compound and cyclic anhydride 西北师范大学 2023-08-08 CN disclosed
CN-111830786-B Photosensitive resin composition containing silane coupling agent 波米科技有限公司 2023-05-23 CN disclosed
CN-112898173-B Method for preparing amide compound by photocatalytic organic amine 湖南中医药大学 2022-10-11 CN disclosed
CN-114595469-A Data encryption and decryption method based on gestures 柴广伟 2022-06-07 CN disclosed
WO-1998049128-A1 PROCESS FOR PREPARING A (HETERO)AROMATIC OLEFIN DSM N.V. (NL) 1998-11-05 WO disclosed
US-5700619-A PHOTOSENSITIVE COMPOSITION COMPRISING DIAZONIUM POLYCONDENSATION PRODUCT AND/OR FREE RADICAL POLYMERIZABLE SYSTEM CONSISTING OF PHOTOINITIATORS AND POLYMERIZABLE COMPONENTS, POLYVINYL ACETAL BINDER HAVING FREE ACID GROUP SUN CHEMICAL CORPORATION (US) 1997-12-23 US disclosed
US-5695905-A Photosensitive compositions and lithographic printing plates utilizing oxazoline modified acid polymers SUN CHEMICAL CORPORATION (US) 1997-12-09 US disclosed
EP-0752430-A2 Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates SUN CHEMICAL CORPORATION (US) 1997-01-08 EP disclosed
EP-0749045-A2 Photosensitive compositions and their use in lithographic plates SUN CHEMICAL CORPORATION (US) 1996-12-18 EP disclosed
US-4917815-A STABILIZED WITH THE CORRESPONDING CARBOXYLIC ACID, PERGLUTARIC ACID AND HYDROGEN PEROXIDE STERLING DRUG INC. (US) 1990-04-17 US disclosed
CN-1034159-A No Rubber compacting corn stalk Wood-based Panel Production technology SIPING CITY CEMENT PLANT JILIN (CN) 1989-07-26 CN disclosed
US-4233309-A Novel 1-substituted-3-acylpyrrole derivatives, platelet aggregation inhibitors containing them, as active ingredients, and processes for production of said derivatives TEIJIN LIMITED (JP) 1980-11-11 US disclosed
EP-0002392-A2 1-substituted-3-acylpyrrole derivatives, process for their preparation and platelet aggregation inhibiting agents containing them TEIJIN LIMITED (JP) 1979-06-13 EP disclosed