Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 4/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.32 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.32 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.32 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.32 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.32 |
| ▸ | TBXA2R | P21731 | 2/20 | 0.32 |
| ▸ | PGR | P06401 | 1/20 | 0.32 |
| ▸ | HTR1A | P08908 | 1/20 | 0.32 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.32 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.32 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.32 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.32 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20210831 | 1.00 | TDP1 (0.44) | TDP1ALDH1A1HSD17B10LMNATSHR | |
| SCHEMBL487419 | 1.00 | TDP1 (0.44) | TDP1ALDH1A1HSD17B10LMNATSHR | |
| SCHEMBL2779992 | 0.96 | ALDH1A1 (0.45) | TDP1ALDH1A1HSD17B10LMNATSHR | |
| SCHEMBL487273 | 0.89 | ALDH1A1 (0.53) | TDP1ALDH1A1HSD17B10LMNATSHR | |
| SCHEMBL895989 | 0.89 | ALDH1A1 (0.53) | TDP1ALDH1A1HSD17B10LMNATSHR | |
| SCHEMBL20210844 | 0.89 | ALDH1A1 (0.53) | TDP1ALDH1A1HSD17B10LMNATSHR | |
| SCHEMBL19064962 | 0.87 | ALDH1A1 (0.47) | TDP1ALDH1A1TSHRPRKCAFAAH | |
| SCHEMBL6531010 | 0.87 | ALDH1A1 (0.47) | TDP1ALDH1A1TSHRPRKCAFAAH | |
| SCHEMBL896774 | 0.86 | ALDH1A1 (0.46) | ALDH1A1TSHRPRKCAFAAH | |
| SCHEMBL22408895 | 0.86 | ALDH1A1 (0.46) | ALDH1A1TSHRPRKCAFAAH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250215318-A1 | ETCHING COMPOSITION, ETCHING METHOD USING SAME, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-07-03 | — | — | US | disclosed |
| EP-3961676-B1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-22 | — | — | EP | disclosed |
| CN-119278503-A | Substrate processing method and substrate manufacturing method | 中央硝子株式会社 | 2025-01-07 | — | — | CN | disclosed |
| US-12187047-B2 | Flow passage member, liquid ejecting head, liquid ejecting apparatus, and method for manufacturing flow passage member | SEIKO EPSON CORPORATION (JP) | 2025-01-07 | — | — | US | disclosed |
| CN-119278504-A | Substrate processing method and substrate manufacturing method | 中央硝子株式会社 | 2025-01-07 | — | — | CN | disclosed |
| US-11945152-B2 | Model material ink set, support material composition, ink set, three-dimensional shaped object, and method for manufacturing three-dimensional shaped object | MAXELL, LTD. (JP) | 2024-04-02 | — | — | US | disclosed |
| EP-3715094-B1 | COMPOSITION FOR MODEL MATERIAL | MAXELL LTD (JP) | 2024-03-27 | — | — | EP | disclosed |
| CN-108026225-B | Resin composition for mold material, resin composition for support material, stereolithography product, and method for producing stereolithography product | 麦克赛尔株式会社 | 2024-03-05 | — | — | CN | disclosed |
| CN-117304414-A | Resin composition for mold material and stereolithography | 麦克赛尔株式会社 | 2023-12-29 | — | — | CN | disclosed |
| WO-2023204141-A1 | ETCHING COMPOSITION, ETCHING METHOD USING SAME, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT | 東京応化工業株式会社 | 2023-10-26 | — | — | WO | disclosed |
| US-20160263899-A1 | INK JET RECORDING APPARATUS AND METHOD FOR MAINTAINING THE SAME | SEIKO EPSON CORPORATION (JP) | 2016-09-15 | — | — | US | disclosed |
| US-9409398-B2 | Maintenance unit and liquid ejecting apparatus | SEIKO EPSON CORPORATION (JP) | 2016-08-09 | — | — | US | disclosed |
| US-20160144626-A1 | MAINTENANCE UNIT AND LIQUID EJECTING APPARATUS | SEIKO EPSON CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |
| CN-105564032-A | Maintenance unit and liquid ejection device | SEIKO EPSON CORP | 2016-05-11 | — | — | CN | disclosed |
| US-20160121614-A1 | MAINTENANCE UNIT AND LIQUID EJECTION DEVICE | SEIKO EPSON CORPORATION (JP) | 2016-05-05 | — | — | US | disclosed |
| US-9199469-B1 | Ink jet recording apparatus and maintenance thereof | SEIKO EPSON CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-20150328897-A1 | INK JET RECORDING APPARATUS AND MAINTENANCE THEREOF | SEIKO EPSON CORPORATION (JP) | 2015-11-19 | — | — | US | disclosed |
| EP-2944472-A1 | INK JET RECORDING APPARATUS AND MAINTENANCE METHOD THEREOF | Seiko Epson Corporation (JP) | 2015-11-18 | — | — | EP | disclosed |
| US-20120082791-A1 | Coating Composition Amenable to Elastomeric Substrates | LIVERSAGE ROBERT RICHARD (US) | 2012-04-05 | — | — | US | disclosed |
| US-20090026425-A1 | COMPOSITION COMPRISING POLYESTER AMIDE ACID AND THE LIKE AND INK-JET INK COMPOSITION USING THE SAME | CHISSO CORPORATION (JP) | 2009-01-29 | — | — | US | disclosed |