SCHEMBL897646

SCHEMBL897646

C=C[SiH2]NCc1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADH1B P00325 1/20 0.43
ADH1C P00326 1/20 0.43
ADH1A P07327 1/20 0.43
ADH7 P40394 1/20 0.43
IDO1 P14902 2/20 0.43
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
THRB P10828 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.42
MAPT P10636 4/20 0.41
CYP3A4 P08684 2/20 0.41
KDM4E B2RXH2 1/20 0.41
ALOX12 P18054 2/20 0.39
ALDH1A1 P00352 1/20 0.39
HPGD P15428 1/20 0.39
CA12 O43570 1/20 0.39
CA2 P00918 1/20 0.39
CA7 P43166 1/20 0.39
CA14 Q9ULX7 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3133242 0.74 IDO1 (0.52) ADH1BADH1CADH1AADH7IDO1
SCHEMBL31302856 0.72 IDO1 (0.50) ADH1BADH1CADH1AADH7IDO1
SCHEMBL14813087 0.70 IDO1 (0.48) ADH1BADH1CADH1AADH7IDO1
SCHEMBL248336 0.70 ADH1B (0.60) ADH1BADH1CADH1AADH7IDO1
SCHEMBL18692045 0.70 IDO1 (0.48) ADH1BADH1CADH1AADH7IDO1
SCHEMBL16582961 0.70 IDO1 (0.48) ADH1BADH1CADH1AADH7IDO1
Hydrochloric Acid SCHEMBL1228267 0.68 ADH1B (0.58) ADH1BADH1CADH1AADH7IDO1
SCHEMBL2855167 0.68 ADH1B (0.58) ADH1BADH1CADH1AADH7IDO1
SCHEMBL28408416 0.68 HDAC8 (0.53) ADH1BADH1CADH1AADH7MEN1
Hydrochloric Acid SCHEMBL4576373 0.67 HDAC8 (0.51) ADH1BADH1CADH1AADH7MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-8199117-A None JP disclosed
US-12454459-B2 Functionalized graphene, method for producing a functionalized graphene, and its use EVONIK OPERATIONS GMBH (DE) 2025-10-28 US disclosed
CN-115720573-B Functionalized graphene, method for producing functionalized graphene and use thereof 赢创运营有限公司 2025-03-11 CN disclosed
US-20230264961-A1 FUNCTIONALIZED GRAPHENE, METHOD FOR PRODUCING A FUNCTIONALIZED GRAPHENE, AND ITS USE EVONIK OPERATIONS GMBH (DE) 2023-08-24 US disclosed
EP-4175910-A2 FUNCTIONALIZED GRAPHENE, METHOD FOR PRODUCING A FUNCTIONALIZED GRAPHENE, AND ITS USE Evonik Operations GmbH (DE) 2023-05-10 EP disclosed
CN-104995254-B Polyacetal resin composition and method for producing same 宝理塑料株式会社 2018-09-21 CN disclosed
CN-104995254-A Polyacetal resin composition and method for producing same POLYPLASTICS CO 2015-10-21 CN disclosed
CN-104918995-A Transparent resin layer composition, and ink-jet ink-receiving layer and display element using same NIPPON STEEL & SUMIKIN CHEM CO 2015-09-16 CN disclosed
US-8647779-B2 Nonaqueous electrolyte composition and nonaqueous electrolyte secondary battery SONY CORPORATION (JP) 2014-02-11 US disclosed
US-20130095378-A1 NONAQUEOUS ELECTROLYTE COMPOSITION AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY SONY CORPORATION (JP) 2013-04-18 US disclosed
US-6039444-A HIGH-SPEED PRINTING REGARDLESS OF THE PROPERTIES OF AQUEOUS INK. INK-RECEIVING LAYER CONTAINING BOTH A WATER-ABSORBING ANIONIC POLYMER AND A WATER-ABSORBING CATIONIC POLYMER, INK JET TOYO BOSEKI KABUSHIKI KAISHA (JP) 2000-03-21 US disclosed
US-5912085-A OPTICAL RECORDING MATERIAL ON SUBSTRATES AND INKS TOYO BOSEKI KABUSHIKI KAISHA (JP) 1999-06-15 US disclosed
EP-0881091-A2 Recording material Toyo Boseki Kabushiki Kaisha (JP) 1998-12-02 EP disclosed
EP-0313252-B1 A coating process for polymer plastics materials E G TECHNOLOGY PARTNERS L P (US) 1998-08-19 EP disclosed
EP-0747230-A2 Ink-jet recording material and production method thereof Toyo Boseki Kabushiki Kaisha (JP) 1996-12-11 EP disclosed
US-5576101-A POLYAMIDE, CURED SILOXANE, NATURAL OR SYNTHETIC RUBBER BRIDGESTONE CORPORATION (JP) 1996-11-19 US disclosed
JP-H08199117-A COMPOSITION FOR COATING AND RESIN MOLDING NIPPON SHOKUBAI CO LTD 1996-08-06 JP disclosed
US-5009924-A Surface treatment using organofunctional silane ENERGY SCIENCES INC. (US) 1991-04-23 US disclosed
EP-0313252-A2 A coating process for polymer plastics materials E.G. Technology Partners, L.P. (US) 1989-04-26 EP disclosed
US-4803126-A Process to permit improvement of functional properties of polyolefin articles by electron-beam initiated polymerization ENERGY SCIENCES INC. (US) 1989-02-07 US disclosed