Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.50 |
| ▸ | MEN1 | O00255 | 3/20 | 0.50 |
| ▸ | SCN2A | Q99250 | 5/20 | 0.46 |
| ▸ | CA9 | Q16790 | 3/20 | 0.46 |
| ▸ | CA12 | O43570 | 2/20 | 0.46 |
| ▸ | CA1 | P00915 | 2/20 | 0.46 |
| ▸ | CA2 | P00918 | 2/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | NR1H3 | Q13133 | 2/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL915633 | 0.80 | CES1 (0.64) | GAA | |
| SCHEMBL4695023 | 0.80 | GAA (0.67) | KMT2AMEN1GAARAB9A | |
| SCHEMBL8314729 | 0.78 | CES1 (0.44) | KMT2AMEN1GAARAB9A | |
| SCHEMBL17047745 | 0.78 | PARP1 (0.40) | KMT2AMEN1HTTRAB9A | |
| SCHEMBL4649471 | 0.75 | KMT2A (0.78) | KMT2AMEN1SCN2ACA9CA12 | |
| N-Phenyl-Phthalimide SCHEMBL123618 | 0.73 | KMT2A (0.68) | KMT2AMEN1SCN2ACA9CA12 | |
| SCHEMBL19773976 | 0.73 | KMT2A (0.68) | KMT2AMEN1SCN2ACA9CA12 | |
| N-Phenyl-Phthalimide SCHEMBL29819622 | 0.73 | KMT2A (0.68) | KMT2AMEN1SCN2ACA9CA12 | |
| SCHEMBL21478341 | 0.73 | MEN1 (0.38) | KMT2AMEN1RAB9A | |
| SCHEMBL28090496 | 0.72 | MGLL (0.54) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0311033-A2 | 3-Phthalimidothiophenes or their addition products with morpholine, process for their preparation, their use in the preparation of 3-amino-thiophenes and the 3-amino-5-chlorthiopene | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-04-12 | — | — | EP | claimed |
| JP-1128980-A | — | — | None | — | — | JP | disclosed |
| CN-119403840-A | Photocurable composition, method for producing cured film, solid-state imaging element, image display device, and radical polymerization initiator | 富士胶片株式会社 | 2025-02-07 | — | — | CN | disclosed |
| CN-112979675-B | Small molecular sulfur-containing heterocyclic compound | 维眸生物科技（上海）有限公司 | 2023-12-19 | — | — | CN | disclosed |
| CN-111217834-B | Nitroxide derivatives of ROCK kinase inhibitors | 维眸生物科技（上海）有限公司 | 2021-10-26 | — | — | CN | disclosed |
| CN-112979675-A | Small-molecule sulfur-containing heterocyclic compound | 维眸生物科技（上海）有限公司 | 2021-06-18 | — | — | CN | disclosed |
| CN-111217834-A | Nitroxide derivatives of ROCK kinase inhibitors | 维眸生物科技（上海）有限公司 | 2020-06-02 | — | — | CN | disclosed |
| US-5494944-A | BLEND OF MATERIAL POLYMERIZABLE BY FREE RADICAL CATALYSTAND AN IRON COMPOUND | CIBA-GEIGY CORPORATION (US) | 1996-02-27 | — | — | US | disclosed |
| US-5371115-A | Having sensitizers, electron acceptors selected from peracids, hydroperoxides and quinones; photosensitive, photoresists | CIBA-GEIGY CORPORATION (US) | 1994-12-06 | — | — | US | disclosed |
| EP-0295211-B1 | Photoresist composition | CIBA GEIGY AG (CH) | 1994-03-16 | — | — | EP | disclosed |
| EP-0311033-A2 | 3-Phthalimidothiophenes or their addition products with morpholine, process for their preparation, their use in the preparation of 3-amino-thiophenes and the 3-amino-5-chlorthiopene | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-04-12 | — | — | EP | disclosed |
| EP-0311033-A2 | 3-Phthalimidothiophenes or their addition products with morpholine, process for their preparation, their use in the preparation of 3-amino-thiophenes and the 3-amino-5-chlorthiopene | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-04-12 | — | — | EP | disclosed |
| EP-0295211-A2 | Photoresist composition | CIBA-GEIGY AG (CH) | 1988-12-14 | — | — | EP | disclosed |
| US-4786569-A | Adhesively bonded photostructurable polyimide film | CIBA-GEIGY CORPORATION (US) | 1988-11-22 | — | — | US | disclosed |
| EP-0153904-B1 | PROCESS FOR THE PREPARATION OF A PROTECTION LAYER OR A RELIEF PATTERN | CIBA-GEIGY AG (CH) | 1988-09-14 | — | — | EP | disclosed |
| EP-0152377-B1 | CURABLE COMPOSITIONS AND THEIR USE | CIBA-GEIGY AG (CH) | 1987-12-09 | — | — | EP | disclosed |
| EP-0214103-A2 | Adhesively bonded photostructurable polyimide foil | CIBA-GEIGY AG (CH) | 1987-03-11 | — | — | EP | disclosed |
| US-4624912-A | EXPOSURE TO ELECTRON OR ACTINIC RADIATION, THEN HEATING | CIBA-GEIGY CORPORATION (US) | 1986-11-25 | — | — | US | disclosed |
| EP-0153904-A2 | Process for the preparation of a protection layer or a relief pattern | CIBA-GEIGY AG (CH) | 1985-09-04 | — | — | EP | disclosed |
| EP-0152377-A2 | Curable compositions and their use | CIBA-GEIGY AG (CH) | 1985-08-21 | — | — | EP | disclosed |