⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16705783 | 0.97 | — | — | |
| SCHEMBL23836931 | 0.97 | — | — | |
| SCHEMBL9973086 | 0.82 | — | — | |
| SCHEMBL15053631 | 0.81 | — | — | |
| SCHEMBL20628708 | 0.80 | — | — | |
| SCHEMBL24070435 | 0.80 | — | — | |
| SCHEMBL13084133 | 0.79 | — | — | |
| SCHEMBL7871365 | 0.77 | — | — | |
| SCHEMBL600277 | 0.77 | — | — | |
| SCHEMBL8116554 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5399655-A | Acid-labile poly(amic acetal ester) | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-03-21 | — | — | US | claimed |
| US-5516875-A | POLYAMIDES ESTERIFIED WITH VINYL ETHERS, PHOTOACID CATALYZED CLEAVAGE OF THE ACID LABILE ESTERS, IMIDATION | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-05-14 | — | — | US | disclosed |
| EP-0601063-B1 | FLUORINE-CONTAINING DIAMINES, POLYAMIDES, AND POLYIMIDES | DU PONT (US) | 1995-10-18 | — | — | EP | disclosed |
| EP-0536200-B1 | FLUORINE-CONTAINING ACRYLATE AND METHACRYLATE SIDE-CHAIN LIQUID CRYSTAL MONOMERS AND POLYMERS | MINNESOTA MINING & MFG (US) | 1995-10-11 | — | — | EP | disclosed |
| US-5399655-A | Acid-labile poly(amic acetal ester) | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-03-21 | — | — | US | disclosed |
| US-5399460-A | Aminoacrylated polyimide | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-03-21 | — | — | US | disclosed |
| WO-1995004305-A1 | PHOTOSENSITIVE FLUORINATED POLY(AMIC ACID) AMINOACRYLATE SALT | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-02-09 | — | — | WO | disclosed |
| US-5322917-A | Fluorine-containing diamines polyamides, and polyimides | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-06-21 | — | — | US | disclosed |
| EP-0601063-A1 | FLUORINE-CONTAINING DIAMINES, POLYAMIDES, AND POLYIMIDES. | DU PONT (US) | 1994-06-15 | — | — | EP | disclosed |
| US-5302489-A | Patterning a photoresist | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-04-12 | — | — | US | disclosed |
| US-5286841-A | Fluorine-containing diamines, polyamides, and polyimides | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-02-15 | — | — | US | disclosed |
| EP-0536200-A1 | FLUORINE-CONTAINING ACRYLATE AND METHACRYLATE SIDE-CHAIN LIQUID CRYSTAL MONOMERS AND POLYMERS. | MINNESOTA MINING & MFG (US) | 1993-04-14 | — | — | EP | disclosed |
| WO-1993004033-A1 | FLUORINE-CONTAINING DIAMINES, POLYAMIDES, AND POLYIMIDES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-03-04 | — | — | WO | disclosed |
| US-5175367-A | Fluorine-containing diamines, polyamides, and polyimides | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-12-29 | — | — | US | disclosed |
| US-5087672-A | Lower birefringence and viscosity, increased hydrophobicity | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1992-02-11 | — | — | US | disclosed |
| WO-1991019773-A1 | FLUORINE-CONTAINING ACRYLATE AND METHACRYLATE SIDE-CHAIN LIQUID CRYSTAL MONOMERS AND POLYMERS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1991-12-26 | — | — | WO | disclosed |