SCHEMBL8990102

SCHEMBL8990102

Cc1cc(-c2cc(C)cc(C3CCCCC3)c2O)c(O)c(C2CCCCC2)c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.42
MEN1 O00255 1/20 0.42
MAPT P10636 1/20 0.42
KMT2A Q03164 1/20 0.42
PSMB5 P28074 1/20 0.41
NR1I2 O75469 1/20 0.41
KDM4B O94953 1/20 0.41
CHRM1 P11229 1/20 0.41
TBXA2R P21731 1/20 0.41
ADRA1A P35348 1/20 0.41
DOHH Q9BU89 1/20 0.41
PTGDR2 Q9Y5Y4 1/20 0.41
UGT2B17 O75795 2/20 0.37
NUDT1 P36639 1/20 0.36
BACE1 P56817 1/20 0.36
HSP90AA1 P07900 1/20 0.36
PTPN5 P54829 3/20 0.35
PTPN2 P17706 1/20 0.35
LMNA P02545 1/20 0.35
TP53 P04637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10956529 0.90 KDM4E (0.46) KDM4EMEN1MAPTKMT2APSMB5
SCHEMBL2334220 0.90 KDM4E (0.46) KDM4EMEN1MAPTKMT2APSMB5
SCHEMBL294290 0.90 KDM4E (0.46) KDM4EMEN1MAPTKMT2APSMB5
Methane SCHEMBL11206867 0.88 KDM4E (0.45) KDM4EMEN1MAPTKMT2APSMB5
SCHEMBL36429 0.88 KDM4E (0.43) KDM4EMEN1MAPTKMT2APSMB5
SCHEMBL11793557 0.85 PSMB5 (0.49) KDM4EMEN1MAPTKMT2APSMB5
SCHEMBL10452977 0.85 PSMB5 (0.49) KDM4EMEN1MAPTKMT2APSMB5
Methane SCHEMBL39470 0.83 PSMB5 (0.47) KDM4EMEN1MAPTKMT2APSMB5
Ethane SCHEMBL6550192 0.83 PSMB5 (0.47) KDM4EMEN1MAPTKMT2APSMB5
SCHEMBL11700915 0.82 PSMB5 (0.46) KDM4EMEN1MAPTKMT2APSMB5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0509740-B1 Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material CANON KK (JP) 1996-06-26 EP claimed
EP-0509740-B1 Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material CANON KK (JP) 1996-06-26 EP disclosed
US-5262295-A Biphenyldihydroxide reducing agent for silver halide emulsion layers CANON KABUSHIKI KAISHA (JP) 1993-11-16 US disclosed
EP-0509740-A1 Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material CANON KABUSHIKI KAISHA (JP) 1992-10-21 EP disclosed