SCHEMBL8995940

SCHEMBL8995940

O=C(CCC(=O)NCO)NCO

nearest known ligand 0.44

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.44
RECQL P46063 1/20 0.40
KDM4E B2RXH2 2/20 0.36
KDM5C P41229 2/20 0.36
PHF8 Q9UPP1 2/20 0.36
KDM2A Q9Y2K7 2/20 0.36
KDM6B O15054 1/20 0.36
FOLH1 Q04609 1/20 0.36
EGLN1 Q9GZT9 1/20 0.36
TSHR P16473 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
MAPT P10636 1/20 0.36
TPSAB1 Q15661 1/20 0.36
NAAA Q02083 1/20 0.36
FAAH O00519 1/20 0.35
GAA P10253 2/20 0.34
L3MBTL1 Q9Y468 1/20 0.33
CASP2 P42575 1/20 0.33
PTPN1 P18031 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11761233 0.88 PHF8 (0.55) ALDH1A1KDM4EKDM5CPHF8KDM2A
SCHEMBL13241887 0.87 RECQL (0.54) ALDH1A1RECQLTSHRSMN1; SMN2MAPT
SCHEMBL11773061 0.86 ALDH1A1 (0.38) ALDH1A1RECQLKDM4EKDM5CPHF8
SCHEMBL4357532 0.84 HDAC3 (0.52) ALDH1A1RECQLTSHRSMN1; SMN2MAPT
SCHEMBL4896639 0.82
SCHEMBL11714158 0.82
SCHEMBL607006 0.82
SCHEMBL9188241 0.82
SCHEMBL19448715 0.82 TSHR (0.62) ALDH1A1RECQLKDM4ETSHRMAPT
SCHEMBL3305420 0.81 ALDH1A1 (0.41) ALDH1A1RECQLSMN1; SMN2TPSAB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4438189-A POLYUNSATURATED COMPOUND, CROSSLINKABLE EPOXY OR METHYLOL COMPOUND HOECHST AKTIENGESELLSCHAFT (DE) 1984-03-20 US claimed
US-20100183978-A1 SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN FORMING METHOD USING THE TREATING AGENT FUJIFILM CORPORATION (JP) 2010-07-22 US disclosed
US-20100183978-A1 SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN FORMING METHOD USING THE TREATING AGENT FUJIFILM CORPORATION (JP) 2010-07-22 US disclosed
US-5589529-A STABILIZE ORGANIC MATERIALS AGAINST DAMAGE BY LIGHT, OXYGEN AND/OR HEAT CIBA-GEIGY CORPORATION (US) 1996-12-31 US disclosed
US-5488112-A STABILIZERS FOR ORGANIC POLYMERS AGAINST HEAT. LIGHT AND OXYGEN CIBA-GEIGY CORPORATION (US) 1996-01-30 US disclosed
US-3976620-A Phosphorus containing amides flame retardants HOOKER CHEMICALS & PLASTICS CORPORATION (US) 1976-08-24 US disclosed