⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14902958 | 1.00 | — | — | |
| SCHEMBL9004508 | 1.00 | — | — | |
| SCHEMBL9004497 | 1.00 | — | — | |
| SCHEMBL9178213 | 1.00 | — | — | |
| SCHEMBL11950506 | 1.00 | — | — | |
| SCHEMBL4761256 | 1.00 | — | — | |
| SCHEMBL9004474 | 1.00 | — | — | |
| SCHEMBL9004473 | 1.00 | — | — | |
| SCHEMBL3868343 | 1.00 | — | — | |
| SCHEMBL9004501 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170255097-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING THE SAME, PATTERNING PROCESS, AND LAMINATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-07 | — | — | US | disclosed |
| US-20160200877-A1 | SILICONE SKELETON-CONTAINING POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, SUBSTRATE, AND SEMICONDUCTOR APPARATUS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-07-14 | — | — | US | disclosed |
| US-9377689-B2 | Silicone structure-bearing polymer, negative resist composition, photo-curable dry film, patterning process, and electric/electronic part-protecting film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-28 | — | — | US | disclosed |
| US-20160097973-A1 | SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND METHOD FOR PRODUCING SAME, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, AND SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-07 | — | — | US | disclosed |
| US-20160040048-A1 | LIQUID EPOXY RESIN COMPOSITION AND ADHESIVE AGENT FOR HEATSINK AND STIFFENER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-11 | — | — | US | disclosed |
| US-20160033865-A1 | SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART-PROTECTING FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-04 | — | — | US | disclosed |
| EP-0442097-B1 | Poly(arylenevinylene siloxanes) | CONSORTIUM ELEKTROCHEM IND (DE) | 1996-10-09 | — | — | EP | disclosed |
| EP-0582615-B1 | POLYIMIDE SILOXANES WHICH ALSO INCLUDE ESTER AND/OR AMIDE GROUPS | CONSORTIUM ELEKTROCHEM IND (DE) | 1995-06-28 | — | — | EP | disclosed |
| EP-0442097-A2 | Poly(arylenevinylene siloxanes) | Consortium für elektrochemische Industrie GmbH (DE) | 1991-08-21 | — | — | EP | disclosed |
| US-5009934-A | Process for preparing poly-(imidesiloxanes) | WACKER-CHEMIE GMBH (DE) | 1991-04-23 | — | — | US | disclosed |