SCHEMBL9006491

SCHEMBL9006491

CC1C/C(=C/c2ccc(N)cc2)C(=O)/C(=C/c2ccc(OC(F)=C(F)F)cc2)C1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 7/20 0.47
NPC1 O15118 4/20 0.47
RAB9A P51151 4/20 0.47
MAPK1 P28482 3/20 0.47
HTT P42858 3/20 0.47
HSP90AA1 P07900 1/20 0.47
MEN1 O00255 6/20 0.40
KMT2A Q03164 6/20 0.40
LMNA P02545 4/20 0.40
MITF O75030 1/20 0.40
NSD2 O96028 1/20 0.40
ATM Q13315 1/20 0.40
CYP1A2 P05177 1/20 0.38
F2 P00734 6/20 0.38
F10 P00742 5/20 0.38
CLK1 P49759 1/20 0.37
DYRK1A Q13627 1/20 0.37
DYRK1B Q9Y463 1/20 0.37
ALDH1A1 P00352 4/20 0.36
PKM P14618 3/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006499 1.00 MAPT (0.47) MAPTNPC1RAB9AMAPK1HTT
SCHEMBL9006505 0.94 MAPT (0.52) MAPTNPC1RAB9AMAPK1HTT
SCHEMBL9006514 0.94 MAPT (0.52) MAPTNPC1RAB9AMAPK1HTT
SCHEMBL9006623 0.89 MAPT (0.48) MAPTNPC1RAB9AMAPK1HTT
SCHEMBL9006627 0.89 MAPT (0.48) MAPTNPC1RAB9AMAPK1HTT
SCHEMBL9006539 0.84 CYP1A2 (0.54) MAPTHTTMEN1KMT2ACYP1A2
SCHEMBL9006531 0.84 CYP1A2 (0.54) MAPTHTTMEN1KMT2ACYP1A2
SCHEMBL9006554 0.83 MAPT (0.42) MAPTNPC1RAB9AMAPK1HTT
SCHEMBL9006515 0.83 MAPT (0.42) MAPTNPC1RAB9AMAPK1HTT
SCHEMBL9006508 0.83 MAPT (0.42) MAPTNPC1RAB9AMAPK1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed