SCHEMBL9006515

SCHEMBL9006515

CC1CC(=Cc2ccc(CC(=O)O)cc2)C(=O)C(=Cc2ccc(OC(F)=C(F)F)cc2)C1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.42
MAPK1 P28482 3/20 0.42
NPC1 O15118 3/20 0.42
RAB9A P51151 3/20 0.42
HTT P42858 2/20 0.42
HSP90AA1 P07900 1/20 0.42
HPGD P15428 2/20 0.39
KMT2A Q03164 5/20 0.38
LMNA P02545 3/20 0.38
ALDH1A1 P00352 3/20 0.38
KDM4E B2RXH2 2/20 0.38
MEN1 O00255 3/20 0.37
MITF O75030 1/20 0.37
NSD2 O96028 1/20 0.37
ATM Q13315 1/20 0.37
USP2 O75604 1/20 0.35
GAA P10253 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
TLR9 Q9NR96 1/20 0.35
TDP1 Q9NUW8 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006508 1.00 MAPT (0.42) MAPTMAPK1NPC1RAB9AHTT
SCHEMBL9006505 0.89 MAPT (0.52) MAPTMAPK1NPC1RAB9AHTT
SCHEMBL9006514 0.89 MAPT (0.52) MAPTMAPK1NPC1RAB9AHTT
SCHEMBL9006423 0.85 CYP1A2 (0.48) MAPTHTTHPGDGAAF2
SCHEMBL9006418 0.85 CYP1A2 (0.48) MAPTHTTHPGDGAAF2
SCHEMBL9006623 0.84 MAPT (0.48) MAPTMAPK1NPC1RAB9AHTT
SCHEMBL9006627 0.84 MAPT (0.48) MAPTMAPK1NPC1RAB9AHTT
SCHEMBL9006491 0.83 MAPT (0.47) MAPTMAPK1NPC1RAB9AHTT
SCHEMBL9006499 0.83 MAPT (0.47) MAPTMAPK1NPC1RAB9AHTT
SCHEMBL9006554 0.78 MAPT (0.42) MAPTMAPK1NPC1RAB9AHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed