⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL460862 | 0.56 | — | — | |
| SCHEMBL1441211 | 0.43 | — | — | |
| SCHEMBL29457302 | 0.35 | — | — | |
| SCHEMBL8911858 | 0.35 | — | — | |
| SCHEMBL28661666 | 0.35 | — | — | |
| Methane SCHEMBL23044967 | 0.35 | — | — | |
| SCHEMBL30550943 | 0.35 | — | — | |
| Hydrogen Sulfide SCHEMBL16538967 | 0.35 | — | — | |
| SCHEMBL6559802 | 0.35 | — | — | |
| SCHEMBL10004990 | 0.35 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5449800-A | Silicon-containing pentacyclic compound, a silicon-containing ladder polymer, and methods for producing the same | DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1995-09-12 | — | — | US | claimed |
| JP-7233176-A | — | — | None | — | — | JP | disclosed |
| JP-8239389-A | — | — | None | — | — | JP | disclosed |
| US-20100233482-A1 | Organic silicon oxide fine particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device | HAMADA YOSHITAKA | 2010-09-16 | — | — | US | disclosed |
| US-7754330-B2 | Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-13 | — | — | US | disclosed |
| US-20090294922-A1 | ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE | PANASONIC CORPORATION (JP) | 2009-12-03 | — | — | US | disclosed |
| US-20090294726-A1 | ORGANIC SILICON OXIDE FINE PARTICLES AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-12-03 | — | — | US | disclosed |
| JP-H08239389-A | SILICON-CONTAINING LADDER POLYMER AND ITS PRODUCTION | AGENCY OF IND SCIENCE & TECHNOL | 1996-09-17 | — | — | JP | disclosed |
| US-5449800-A | Silicon-containing pentacyclic compound, a silicon-containing ladder polymer, and methods for producing the same | DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1995-09-12 | — | — | US | disclosed |
| US-5449800-A | Silicon-containing pentacyclic compound, a silicon-containing ladder polymer, and methods for producing the same | DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1995-09-12 | — | — | US | disclosed |
| JP-H07233176-A | SILICON-CONTAINING PENTACYCLIC COMPOUND, SILICON-CONTAINING LADDER POLYMER AND ITS PRODUCTION | AGENCY OF IND SCIENCE & TECHNOL | 1995-09-05 | — | — | JP | disclosed |