SCHEMBL90401

SCHEMBL90401

CN1CCCCC1(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL90094 0.92
SCHEMBL90801 0.76
SCHEMBL1753691 0.71 SOS1 (0.36)
SCHEMBL14962059 0.71 SOS1 (0.52)
SCHEMBL9965969 0.69
SCHEMBL1753461 0.69 SOS1 (0.34)
SCHEMBL19199755 0.69 SOS1 (0.50)
SCHEMBL8732771 0.69 SOS1 (0.50)
SCHEMBL14962058 0.69 SOS1 (0.50)
SCHEMBL765969 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115621548-B Preparation method and application of novel piperidine ionic liquid electrolyte 深圳大学 2024-04-30 CN disclosed
CN-115621548-A Preparation method and application of novel piperidine ionic liquid electrolyte 深圳大学 2023-01-17 CN disclosed
EP-2709985-B1 AMINE DERIVATIVES AS POTASSIUM CHANNEL BLOCKERS BIONOMICS LTD (AU) 2017-10-04 EP disclosed
EP-2154141-B1 Precursors for depositing silicon-containing films and methods using same AIR PROD & CHEM (US) 2016-06-15 EP disclosed
EP-2644609-B1 Precursors for depositing silicon-containing films and methods of using same AIR PROD & CHEM (US) 2015-07-08 EP disclosed
EP-2644609-A2 Precursors for depositing silicon-containing films and methods for making and using same AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-10-02 EP disclosed
US-8129555-B2 Precursors for depositing silicon-containing films and methods for making and using same AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-03-06 US disclosed
US-8129555-B2 Precursors for depositing silicon-containing films and methods for making and using same AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-03-06 US disclosed
US-20100041243-A1 Precursors for Depositing Silicon-containing Films and Methods for Making and Using Same AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-02-18 US disclosed
US-20100041243-A1 Precursors for Depositing Silicon-containing Films and Methods for Making and Using Same AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-02-18 US disclosed
EP-2154141-A2 Precursors for depositing silicon-containing films and methods for making and using same AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-02-17 EP disclosed