SCHEMBL9010403

SCHEMBL9010403

C=C(C)C(=O)ON=C1CCCCC1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.45
KMT2A Q03164 3/20 0.45
FAAH O00519 1/20 0.45
ABHD16A O95870 1/20 0.45
PLA2G7 Q13093 1/20 0.45
NCEH1 Q6PIU2 1/20 0.45
DAGLB Q8NCG7 1/20 0.45
DAGLA Q9Y4D2 1/20 0.45
RAB9A P51151 4/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
NPC1 O15118 1/20 0.41
GAA P10253 1/20 0.40
ALDH1A1 P00352 2/20 0.38
KDM4E B2RXH2 7/20 0.35
RXFP1 Q9HBX9 1/20 0.34
TSHR P16473 1/20 0.33
CASP1 P29466 1/20 0.33
POLB P06746 1/20 0.33
CYP1A2 P05177 1/20 0.32
CYP3A4 P08684 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL212565 0.79 MEN1 (0.50) MEN1KMT2AFAAHABHD16APLA2G7
SCHEMBL212465 0.79 MEN1 (0.50) MEN1KMT2AFAAHABHD16APLA2G7
SCHEMBL214510 0.79 MEN1 (0.50) MEN1KMT2AFAAHABHD16APLA2G7
SCHEMBL215531 0.79 MEN1 (0.50) MEN1KMT2AFAAHABHD16APLA2G7
SCHEMBL213364 0.79 MEN1 (0.50) MEN1KMT2AFAAHABHD16APLA2G7
SCHEMBL212464 0.77 RAB9A (0.47) MEN1KMT2AFAAHABHD16APLA2G7
SCHEMBL10891059 0.73 MEN1 (0.45) MEN1KMT2AFAAHABHD16APLA2G7
SCHEMBL5593997 0.73 KMT2A (0.52) MEN1KMT2AFAAHABHD16APLA2G7
SCHEMBL9860641 0.72 MEN1 (0.51) MEN1KMT2AFAAHABHD16APLA2G7
SCHEMBL11679792 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8304164-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-11-06 US disclosed
US-8304164-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-11-06 US disclosed
US-20110171575-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-07-14 US disclosed
US-20110171575-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-07-14 US disclosed
US-7504195-B2 Photosensitive polymer and photoresist composition DONGJIN SEMICHEM CO., LTD. (KR) 2009-03-17 US disclosed
US-7504195-B2 Photosensitive polymer and photoresist composition DONGJIN SEMICHEM CO., LTD. (KR) 2009-03-17 US disclosed
US-20080057436-A1 PHOTOSENSITIVE POLYMER AND PHOTORESIST COMPOSITION DONGJIN SEMICHEM CO., LTD. (KR) 2008-03-06 US disclosed
US-20080057436-A1 PHOTOSENSITIVE POLYMER AND PHOTORESIST COMPOSITION DONGJIN SEMICHEM CO., LTD. (KR) 2008-03-06 US disclosed
EP-0741126-A2 Process for the preparation of oxime methacrylates RÖHM GMBH (DE) 1996-11-06 EP disclosed