SCHEMBL9012380

SCHEMBL9012380

C1CC(CNC2CCC2)C1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADH1B P00325 1/20 0.42
ADH1C P00326 1/20 0.42
ADH1A P07327 1/20 0.42
ADH4 P08319 1/20 0.42
ADH7 P40394 1/20 0.42
EPHX1 P07099 3/20 0.40
CHRM2 P08172 1/20 0.38
CHRM4 P08173 1/20 0.38
CHRM5 P08912 1/20 0.38
ADRA2B P18089 1/20 0.38
ADRA2C P18825 1/20 0.38
MAN1B1 Q9UKM7 1/20 0.38
KDM4E B2RXH2 1/20 0.37
GLB1 P16278 1/20 0.35
TMEM97 Q5BJF2 3/20 0.35
LMNA P02545 1/20 0.34
CXCR3 P49682 1/20 0.34
HPGD P15428 1/20 0.33
KMT2A Q03164 1/20 0.33
JAK2 O60674 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21939606 0.97 ADH1B (0.46) ADH1BADH1CADH1AADH4ADH7
SCHEMBL21479462 0.97 ADH1B (0.46) ADH1BADH1CADH1AADH4ADH7
SCHEMBL23906683 0.95 ADH1B (0.50) ADH1BADH1CADH1AADH4ADH7
SCHEMBL25998284 0.95 ADH1B (0.50) ADH1BADH1CADH1AADH4ADH7
SCHEMBL23900254 0.95 ADH1B (0.50) ADH1BADH1CADH1AADH4ADH7
SCHEMBL5201541 0.94 EPHX1 (0.45) ADH1BADH1CADH1AADH4ADH7
SCHEMBL1679210 0.94
SCHEMBL1679234 0.94
SCHEMBL24379883 0.92 EPHX1 (0.48) ADH1BADH1CADH1AADH4ADH7
SCHEMBL22802804 0.92 EPHX1 (0.48) ADH1BADH1CADH1AADH4ADH7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11525072-B2 Materials and methods for chemical mechanical polishing of ruthenium-containing materials TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2022-12-13 US disclosed
US-20210171800-A1 Materials and Methods for Chemical Mechanical Polishing of Ruthenium-Containing Materials TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2021-06-10 US disclosed
US-10858261-B2 Method for obtaining calcium aluminates from non-saline aluminum slags ARZYZ, S.A. DE C.V. (MX) 2020-12-08 US disclosed
US-5525506-A Process for production of avermectins and cultures therefor PFIZER INC. (US) 1996-06-11 US disclosed
US-5238848-A Cultures for production of avermectins PFIZER INC (US) 1993-08-24 US disclosed
US-5077278-A Parasiticides PFIZER INC. (US) 1991-12-31 US disclosed