Formamide

Formamide

SCHEMBL9014785

NC=O.OCc1cccs1.OCc1cccs1

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.48
TAAR1 Q96RJ0 1/20 0.48
ADRA2A P08913 3/20 0.47
ADRA2B P18089 3/20 0.47
ADRA2C P18825 3/20 0.47
CYP2C19 P33261 1/20 0.47
SLC1A3 P43003 1/20 0.45
SLC1A2 P43004 1/20 0.45
SLC1A1 P43005 1/20 0.45
DPP4 P27487 1/20 0.44
HPGD P15428 3/20 0.43
ALDH1A1 P00352 2/20 0.43
USP2 O75604 1/20 0.42
RAB9A P51151 2/20 0.41
TDP1 Q9NUW8 1/20 0.41
KMT2A Q03164 2/20 0.40
LMNA P02545 1/20 0.40
MAOB P27338 1/20 0.40
NPC1 O15118 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL93009 0.89
SCHEMBL28469144 0.86
SCHEMBL29688205 0.86
Hydrochloric Acid SCHEMBL15548285 0.86
Dimethylformamide SCHEMBL27604768 0.84 RIPK1 (0.43) POLBTAAR1ADRA2AADRA2BADRA2C
2-Thiophenenecarboxaldehyde SCHEMBL8588732 0.84 HCAR2 (0.42) POLBTAAR1ADRA2AADRA2BADRA2C
Ethylene SCHEMBL27825937 0.84
Thiophene SCHEMBL27588267 0.80 DPP4 (0.46) POLBTAAR1ADRA2AADRA2BADRA2C
SCHEMBL28978617 0.79 CYP2C19 (0.47) POLBTAAR1ADRA2AADRA2BADRA2C
SCHEMBL1617034 0.79 POLB (0.46) POLBCYP2C19DPP4HPGDALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5523495-A REACTING KETONE OR ALDEHYDE WITH A DIHALOPROPENE IN PRESENCE OF ZINC POWDER, WATER AND ACID YIELDS A HALOALLYLCARBINOL WHICH CAN BE DEHALOGENATED WITH A BASE, NONEXPLOSIVE SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-06-04 US disclosed