SCHEMBL903315

SCHEMBL903315

Cc1ccc(Cc2ccc(C)o2)o1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 2/20 0.58
MEN1 O00255 1/20 0.58
CHRM4 P08173 1/20 0.58
CHRM5 P08912 1/20 0.58
CHRM1 P11229 1/20 0.58
CYP2C9 P11712 1/20 0.58
CHRM3 P20309 1/20 0.58
KMT2A Q03164 1/20 0.58
MAPT P10636 3/20 0.56
TDP1 Q9NUW8 2/20 0.56
POLB P06746 2/20 0.52
ALDH1A1 P00352 2/20 0.52
HTT P42858 2/20 0.52
THRB P10828 1/20 0.52
RECQL P46063 1/20 0.52
HSD17B10 Q99714 1/20 0.52
L3MBTL1 Q9Y468 1/20 0.52
ALOX5 P09917 1/20 0.45
NPC1 O15118 2/20 0.42
CYP2D6 P10635 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19481502 0.97 CHRM2 (0.56) CHRM2MEN1CHRM4CHRM5CHRM1
SCHEMBL2614960 0.88 CHRM2 (0.48) CHRM2MEN1CHRM4CHRM5CHRM1
SCHEMBL8973362 0.87 CHRM2 (0.52) CHRM2MEN1CHRM4CHRM5CHRM1
SCHEMBL12582134 0.84 MEN1 (0.45) CHRM2MEN1CHRM4CHRM5CHRM1
SCHEMBL2266485 0.82 POLB (0.47) CHRM2MEN1CHRM4CHRM5CHRM1
SCHEMBL6475097 0.82 CHRM2 (0.58) CHRM2MEN1CHRM4CHRM5CHRM1
SCHEMBL3180066 0.81 CHRM2 (0.47) CHRM2MEN1CHRM4CHRM5CHRM1
SCHEMBL4499814 0.81 ALDH1A1 (0.47) CHRM2MEN1CHRM4CHRM5CHRM1
SCHEMBL144611 0.80
SCHEMBL4494660 0.79 HPGD (0.49) CHRM2MEN1CHRM4CHRM5CHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110437182-B Method for synthesizing bis (5-methylfuran-2-yl) methane BMFM from 5-methylfurfuryl alcohol 5-MFA 南昌大学 2021-07-20 CN claimed
CN-108610227-B Method for preparing bicyclic aromatic compound 中国科学院大连化学物理研究所 2021-02-09 CN claimed
WO-2024180230-A1 5-METHYL-1,3-DIHYDROISOBENZOFURAN-4-OL PREPARED FROM 5-METHYLFURFURYL ALCOHOL AND PROPARGYL ALCOHOL DSM IP ASSETS B.V. (NL) 2024-09-06 WO disclosed
WO-2023178107-A2 ORTHOGONALLY CROSSLINKED PROTEINS, METHODS OF MAKING, AND USES THEREOF THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORK (US) 2023-09-21 WO disclosed
US-11359090-B2 Matted polyamide-pud LUBRIZOL ADVANCED MATERIALS, INC. (US) 2022-06-14 US disclosed
CN-110437182-B Method for synthesizing bis (5-methylfuran-2-yl) methane BMFM from 5-methylfurfuryl alcohol 5-MFA 南昌大学 2021-07-20 CN disclosed
CN-110437182-B Method for synthesizing bis (5-methylfuran-2-yl) methane BMFM from 5-methylfurfuryl alcohol 5-MFA 南昌大学 2021-07-20 CN disclosed
CN-110437182-B Method for synthesizing bis (5-methylfuran-2-yl) methane BMFM from 5-methylfurfuryl alcohol 5-MFA 南昌大学 2021-07-20 CN disclosed
CN-108610227-B Method for preparing bicyclic aromatic compound 中国科学院大连化学物理研究所 2021-02-09 CN disclosed
CN-108610227-B Method for preparing bicyclic aromatic compound 中国科学院大连化学物理研究所 2021-02-09 CN disclosed
US-20200140683-A1 MATTED POLYAMIDE-PUD LUBRIZOL ADVANCED MATERIALS, INC. (US) 2020-05-07 US disclosed
US-8167045-B2 Methods and compositions for stabilizing formation fines and sand HALLIBURTON ENERGY SERVICES, INC. (US) 2012-05-01 US disclosed
WO-2012041521-A1 BIOCOMPOSITE PANEL RESOPAL GMBH (DE) 2012-04-05 WO disclosed
EP-2365735-A2 Luminescent element material and luminescent element comprising the same TORAY INDUSTRIES INC. (JP) 2011-09-14 EP disclosed
US-7611818-B2 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-11-03 US disclosed
US-20090205830-A1 Methods and compositions for stabilizing formation fines and sand HALLIBURTON ENERGY SERVICES, INC. 2009-08-20 US disclosed
US-20090205830-A1 Methods and compositions for stabilizing formation fines and sand HALLIBURTON ENERGY SERVICES, INC. 2009-08-20 US disclosed
US-7318966-B2 Luminescent element material and luminescent element comprising the same TORAY INDUSTRIES, INC. (JP) 2008-01-15 US disclosed
US-7318966-B2 Luminescent element material and luminescent element comprising the same TORAY INDUSTRIES, INC. (JP) 2008-01-15 US disclosed
US-20070077514-A1 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2007-04-05 US disclosed