Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 10/20 | 0.54 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.54 |
| ▸ | LMNA | P02545 | 2/20 | 0.54 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.54 |
| ▸ | PGR | P06401 | 1/20 | 0.54 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.54 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.54 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.54 |
| ▸ | AR | P10275 | 1/20 | 0.54 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.54 |
| ▸ | MAPT | P10636 | 1/20 | 0.54 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.54 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.54 |
| ▸ | DRD1 | P21728 | 1/20 | 0.54 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.54 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.54 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.54 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.54 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15279366 | 0.84 | ESR1 (0.50) | ESR1CYP2C9TDP1LMNACYP1A2 | |
| SCHEMBL13115155 | 0.82 | ESR1 (0.53) | ESR1CYP2C9TDP1LMNACYP1A2 | |
| SCHEMBL8373596 | 0.81 | ESR1 (0.55) | ESR1CYP2C9TDP1LMNACYP1A2 | |
| SCHEMBL15854207 | 0.81 | ESR1 (0.55) | ESR1CYP2C9TDP1LMNACYP1A2 | |
| SCHEMBL14707188 | 0.80 | PPARG (0.36) | ESR1CYP2C9TDP1LMNACYP1A2 | |
| SCHEMBL14621028 | 0.80 | ESR1 (0.46) | ESR1CYP2C9TDP1LMNACYP1A2 | |
| SCHEMBL13367108 | 0.79 | TAAR1 (0.36) | ESR1CYP2C9TDP1LMNACYP1A2 | |
| SCHEMBL11960807 | 0.79 | ESR1 (0.44) | ESR1CYP2C9TDP1LMNACYP1A2 | |
| SCHEMBL13893479 | 0.79 | ADRB2 (0.45) | TDP1LMNASLC6A2SLC6A3SMN1; SMN2 | |
| SCHEMBL784711 | 0.79 | ESR1 (0.44) | ESR1CYP2C9TDP1LMNACYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9023587-B2 | Negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-05-05 | — | — | US | disclosed |
| EP-2535771-A1 | Pattern forming method | Fujifilm Corporation (JP) | 2012-12-19 | — | — | EP | disclosed |
| WO-2012133939-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-10-04 | — | — | WO | disclosed |
| WO-2012043890-A1 | GAP EMBEDDING COMPOSITION, METHOD OF EMBEDDING GAP AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE BY USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-04-05 | — | — | WO | disclosed |
| US-20120034559-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2012-02-09 | — | — | US | disclosed |
| EP-2413191-A1 | Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith | Fujifilm Corporation (JP) | 2012-02-01 | — | — | EP | disclosed |
| EP-2034361-B1 | Compound for use in a photosensitive composition | FUJIFILM CORP (JP) | 2012-02-01 | — | — | EP | disclosed |
| WO-2011108767-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2011-09-09 | — | — | WO | disclosed |
| WO-2011093520-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2011-08-04 | — | — | WO | disclosed |
| WO-2011034213-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-03-24 | — | — | WO | disclosed |
| EP-1816519-B1 | Novel sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition | FUJIFILM CORP (JP) | 2010-11-03 | — | — | EP | disclosed |
| WO-2010114176-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | WO | disclosed |
| EP-2177506-A1 | POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND USED IN THE COMPOSITION | Fujifilm Corporation (JP) | 2010-04-21 | — | — | EP | disclosed |
| WO-2009113735-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-09-17 | — | — | WO | disclosed |
| EP-1835342-A2 | Positive resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2007-09-19 | — | — | EP | disclosed |
| EP-1795961-A1 | Positive resist composition and pattern making method using the same | Fujifilm Corporation (JP) | 2007-06-13 | — | — | EP | disclosed |
| EP-1748318-A2 | Chemical amplification-type resist composition and production process thereof | Fuji Photo Film Co., Ltd. (JP) | 2007-01-31 | — | — | EP | disclosed |
| EP-1739483-A2 | Positive photosensitive composition and pattern forming method using the same | Fuji Photo Film Co., Ltd. (JP) | 2007-01-03 | — | — | EP | disclosed |