Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Bicarbonate. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL81418 | 1.00 | — | — | |
| Bicarbonate SCHEMBL28371980 | 1.00 | — | — | |
| Bicarbonate SCHEMBL28371981 | 1.00 | — | — | |
| Bicarbonate SCHEMBL14881195 | 1.00 | CA1 (0.62) | — | |
| Bicarbonate SCHEMBL8017863 | 1.00 | — | — | |
| Bicarbonate SCHEMBL8017866 | 1.00 | CA1 (0.62) | — | |
| Bicarbonate SCHEMBL15509445 | 0.94 | CA1 (0.56) | — | |
| Bicarbonate SCHEMBL9905488 | 0.94 | CA1 (0.56) | — | |
| Bicarbonate SCHEMBL18862892 | 0.94 | — | — | |
| Bicarbonate SCHEMBL1115491 | 0.94 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 267 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12421379-B2 | Polyethylene pipe | BASF SE (DE) | 2025-09-23 | — | — | US | claimed |
| US-12209174-B2 | Polypropylene composition | BASF SE (DE) | 2025-01-28 | — | — | US | claimed |
| CN-115175958-B | Polyolefin composition | 巴斯夫欧洲公司 | 2024-09-17 | — | — | CN | claimed |
| US-20230407050-A1 | METHOD FOR STABILIZING AN ORGANIC MATERIAL USING A STABILIZER MIXTURE | BASF SE (DE) | 2023-12-21 | — | — | US | claimed |
| CN-113772779-B | Medicament for realizing sludge reduction of low-concentration cyanogen-containing coking wastewater and preparation method thereof | 鞍钢栗田(鞍山)水处理有限公司 | 2023-06-09 | — | — | CN | claimed |
| US-20230146472-A1 | POLYOLEFIN COMPOSITIONS | BASF SE (DE) | 2023-05-11 | — | — | US | claimed |
| CN-116096803-A | Method for stabilizing organic materials using a stabilizer mixture | 巴斯夫欧洲公司 | 2023-05-09 | — | — | CN | claimed |
| EP-4110862-A1 | POLYOLEFIN COMPOSITIONS | BASF SE (DE) | 2023-01-04 | — | — | EP | claimed |
| US-20220056239-A1 | A POLYPROPYLENE COMPOSITION | BASF SE (DE) | 2022-02-24 | — | — | US | claimed |
| CN-113772779-A | Medicament for realizing reduction of low-concentration cyanide-containing coking wastewater sludge and preparation method thereof | 鞍钢栗田(鞍山)水处理有限公司 | 2021-12-10 | — | — | CN | claimed |
| US-7179853-B2 | Resin dispersion for cationic electrodeposition and cationic electrodeposition coating composition including the same | DPI CO., LTD. (KR) | 2007-02-20 | — | — | US | claimed |
| CN-1284046-C | Photosensitive resin composition, photosensitive element, resist pattern, method for producing resist pattern, and substrate having the resist pattern laminated thereon | HITACHI CHEMICAL CO LTD (JP) | 2006-11-08 | — | — | CN | claimed |
| US-7049036-B1 | Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, resist pattern and substrate having the resist pattern laminated thereon | HITACHI CHEMICAL CO., LTD. (JP) | 2006-05-23 | — | — | US | claimed |
| US-20050107496-A1 | Resin dispersion for cationic electrodeposition and cationic electrodeposition coating composition including the same | NOROO PAINT & COATINGS CO., LTD. (KR) | 2005-05-19 | — | — | US | claimed |
| US-6743837-B2 | EPOXY-AMINE ADDITION RESIN; AMINE FUNCTIONAL ACRYLIC CATIONIC POLYMER; ESTERIFICATION PRODUCT OF STYRENE-ALLYLALCOHOL COPOLYMER AND FATTY ACID; BLOCKED POLYISOCYANATE CURING AGENT; MANGANESE PHOSPHATE-ACID REACTION PRODUCT | DIP CO. LTD. (KR) | 2004-06-01 | — | — | US | claimed |
| US-20030094382-A1 | Resin dispersion for cationic electrodeposition and cationic electrodeposition coating composition including the same | DPI CO., LTD. | 2003-05-22 | — | — | US | claimed |
| CN-1390318-A | Photosensitive resin composition, photosensitive element produced using the photosensitive resin composition, method for producing resist pattern, and laminated substrate of resist pattern | HITACHI CHEMICAL CO LTD (JP) | 2003-01-08 | — | — | CN | claimed |
| EP-1229389-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME, METHOD FOR PRODUCING RESIST PATTERN, RESIST PATTERN AND SUBSTRATE HAVING THE RESIST PATTERN LAMINATED THEREON | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2002-08-07 | — | — | EP | claimed |
| US-6077890-A | ADDING TO POLYMER STABILIZER FORMULATION COMPRISING HINDERED AMINE, HYDROXYLAMINE, TWO DIFFERENT HYDROLYTICALLY RESISTANT PHOSPHITES FOR INHIBITING SMOKE FORMATION AND INCREASE IN MELT FLOW RATE DURING MELT PROCESSING; FOR EXAMPLE TRADENAMES CHIMASORB 119 OR 944, AND IRGAFOS 12 AND 168 PHOSPHITES | KIMBERLY-CLARK WORLDWIDE, INC. (US) | 2000-06-20 | — | — | US | claimed |
| US-4529769-A | Blend containing hydrotalcite | PHILLIPS PETROLEUM COMPANY (US) | 1985-07-16 | — | — | US | claimed |