SCHEMBL905315

SCHEMBL905315

CCC=COCCCCCCCCCC

nearest known ligand 0.38

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
THRB P10828 2/20 0.38
TSHR P16473 1/20 0.38
LPAR3 Q9UBY5 5/20 0.37
LPAR2 Q9HBW0 4/20 0.37
LPAR1 Q92633 3/20 0.37
MEN1 O00255 1/20 0.37
HTT P42858 1/20 0.37
KMT2A Q03164 1/20 0.37
MAPT P10636 1/20 0.37
CA1 P00915 4/20 0.35
CA2 P00918 4/20 0.35
CA9 Q16790 4/20 0.35
NAAA Q02083 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14939724 1.00 THRB (0.38) THRBTSHRLPAR3LPAR2LPAR1
SCHEMBL489185 1.00 THRB (0.38) THRBTSHRLPAR3LPAR2LPAR1
SCHEMBL9997345 1.00 THRB (0.38) THRBTSHRLPAR3LPAR2LPAR1
SCHEMBL14939429 1.00 THRB (0.38) THRBTSHRLPAR3LPAR2LPAR1
SCHEMBL14939428 1.00 THRB (0.38) THRBTSHRLPAR3LPAR2LPAR1
SCHEMBL14939723 1.00 THRB (0.38) THRBTSHRLPAR3LPAR2LPAR1
SCHEMBL7942945 0.98 LPAR1 (0.34) THRBTSHRLPAR3LPAR2LPAR1
SCHEMBL7942943 0.98 LPAR1 (0.34) THRBTSHRLPAR3LPAR2LPAR1
SCHEMBL846247 0.93 LPAR2 (0.36) LPAR3LPAR2LPAR1
SCHEMBL5858060 0.93 LPAR2 (0.36) LPAR3LPAR2LPAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101620376-B Curing combination for stamping, condensate using the combination and method for producing the same, and members for liquid crystal display device FUJI PHOTO FILM CO LTD 2013-09-18 CN disclosed
EP-2556532-A1 CURABLE COMPOSITION FOR IMPRINTS AND PRODUCING METHOD OF POLYMERIZABLE MONOMER FOR IMPRINTS FUJIFILM Corporation (JP) 2013-02-13 EP disclosed
EP-2499659-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM Corporation (JP) 2012-09-19 EP disclosed
WO-2011126101-A1 CURABLE COMPOSITION FOR IMPRINTS AND PRODUCING METHOD OF POLYMERIZABLE MONOMER FOR IMPRINTS FUJIFILM CORPORATION (JP) 2011-10-13 WO disclosed
WO-2011126131-A1 PATTERN FORMING METHOD AND PROCESS FOR PRODUCING PATTERN SUBSTRATES FUJIFILM CORPORATION (JP) 2011-10-13 WO disclosed
EP-2342243-A1 COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD FUJIFILM Corporation (JP) 2011-07-13 EP disclosed
WO-2011059104-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2011-05-19 WO disclosed
WO-2011040635-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2011-04-07 WO disclosed
EP-2268680-A1 CURABLE COMPOSITION FOR IMPRINT,PATTERNING METHOD AND PATTERN FUJIFILM Corporation (JP) 2011-01-05 EP disclosed
WO-2010104188-A1 CURABLE COMPOSITION FOR IMPRINT,PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2010-09-16 WO disclosed
WO-2010050614-A1 COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD FUJIFILM CORPORATION (JP) 2010-05-06 WO disclosed
CN-101620376-A Curing combination for stamping, condensate using the combination and method for producing the same, and members for liquid crystal display device FUJI PHOTO FILM CO LTD 2010-01-06 CN disclosed
CN-101620377-A Curing combination for nanometer stamping, condensate and method for producing the same, and members for liquid crystal display device FUJI PHOTO FILM CO LTD 2010-01-06 CN disclosed