Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | CES2 | O00748 | 1/20 | 0.34 |
| ▸ | CES1 | P23141 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.31 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.31 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.30 |
| ▸ | TP53 | P04637 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL906217 | 0.87 | MEN1 (0.35) | CES2CES1ALDH1A1 | |
| SCHEMBL2051184 | 0.78 | ALDH1A1 (0.47) | HTTCES2CES1ALDH1A1CYP2C19 | |
| SCHEMBL2999018 | 0.77 | ALDH1A1 (0.49) | HTTCES2CES1ALDH1A1GAA | |
| SCHEMBL29117660 | 0.77 | ALDH1A1 (0.49) | HTTCES2CES1ALDH1A1GAA | |
| SCHEMBL29117757 | 0.77 | ALDH1A1 (0.49) | HTTCES2CES1ALDH1A1GAA | |
| SCHEMBL29117857 | 0.74 | ALDH1A1 (0.46) | HTTALDH1A1GAA | |
| SCHEMBL6871297 | 0.74 | ALDH1A1 (0.43) | CES2CES1ALDH1A1HDAC8HDAC6 | |
| SCHEMBL29117580 | 0.74 | ALDH1A1 (0.39) | CES2CES1ALDH1A1EPHX1 | |
| SCHEMBL27547851 | 0.74 | ALDH1A1 (0.39) | CES2CES1ALDH1A1EPHX1 | |
| SCHEMBL6866876 | 0.74 | EPHX1 (0.41) | CES2CES1ALDH1A1LMNAHDAC8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9182674-B2 | Immersion upper layer film forming composition and method of forming photoresist pattern | JSR CORPORATION (JP) | 2015-11-10 | — | — | US | disclosed |
| EP-2468780-B1 | Copolymer and top coating composition | JSR CORP (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-8580482-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2013-11-12 | — | — | US | disclosed |
| CN-101080674-B | Composition for forming antireflection film, layered product, and method for forming resist pattern | JSR CORP | 2013-09-18 | — | — | CN | disclosed |
| EP-1806370-B1 | COPOLYMER AND UPPER FILM-FORMING COMPOSITION | JSR CORP (JP) | 2013-05-22 | — | — | EP | disclosed |
| EP-2277929-B1 | Copolymer and top coating composition | JSR CORP (JP) | 2012-11-21 | — | — | EP | disclosed |
| US-20120282553-A1 | IMMERSION UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2012-11-08 | — | — | US | disclosed |
| EP-2315078-B1 | Upper layer film forming composition for liquid immersion and method of forming photoresist pattern | JSR CORP (JP) | 2012-10-17 | — | — | EP | disclosed |
| EP-2468780-A1 | Copolymer and top coating composition | JSR Corporation (JP) | 2012-06-27 | — | — | EP | disclosed |
| US-20120101205-A1 | COPOLYMER AND TOP COATING COMPOSITION | JSR CORPORATION (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20100266953-A1 | COPOLYMER AND TOP COATING COMPOSITION | JSR CORPORATION (JP) | 2010-10-21 | — | — | US | disclosed |
| US-7781142-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2010-08-24 | — | — | US | disclosed |
| US-7709182-B2 | Composition for forming antireflection film, layered product, and method of forming resist pattern | JSR CORPORATION (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20080124524-A1 | Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern | JSR CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| US-20080038661-A1 | Copolymer and Top Coating Composition | JSR CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| CN-101080674-A | Composition for forming antireflection film, layered product, and method for forming resist pattern | JSR CORP (JP) | 2007-11-28 | — | — | CN | disclosed |
| US-20070269734-A1 | Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| EP-1818723-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR Corporation (JP) | 2007-08-15 | — | — | EP | disclosed |
| EP-1806370-A1 | COPOLYMER AND UPPER FILM-FORMING COMPOSITION | JSR Corporation (JP) | 2007-07-11 | — | — | EP | disclosed |
| EP-1708027-A1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2006-10-04 | — | — | EP | disclosed |