SCHEMBL9065284

SCHEMBL9065284

Cc1ccc(C(C)(C)c2ccc(C)cc2C)c(C)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 4/20 0.44
TP53 P04637 2/20 0.44
CASR P41180 3/20 0.40
CYP1A2 P05177 2/20 0.39
CYP2A6 P11509 2/20 0.39
ALDH1A1 P00352 1/20 0.39
RAPGEF4 Q8WZA2 2/20 0.37
TSHR P16473 1/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
LMNA P02545 1/20 0.36
MAPT P10636 1/20 0.36
GPR55 Q9Y2T6 1/20 0.36
ACHE P22303 2/20 0.35
CYP3A4 P08684 1/20 0.35
THRB P10828 1/20 0.35
ALOX15 P16050 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
TRPA1 O75762 1/20 0.35
ESR1 P03372 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL114856 0.84 TDP1 (0.44) TDP1TP53CASRCYP1A2CYP2A6
SCHEMBL9346593 0.84 TDP1 (0.44) TDP1TP53CASRCYP1A2CYP2A6
SCHEMBL6546944 0.83 MAPT (0.47) TDP1TP53CASRCYP2A6ALDH1A1
SCHEMBL18242406 0.82 TDP1 (0.42) TDP1TP53CASRCYP1A2CYP2A6
SCHEMBL17972841 0.80 CASR (0.41) TDP1TP53CASRCYP1A2CYP2A6
SCHEMBL12180439 0.80 TDP1 (0.46) TDP1TP53CASRCYP1A2CYP2A6
SCHEMBL18546040 0.80 CASR (0.53) TDP1TP53CASRCYP1A2CYP2A6
SCHEMBL22667817 0.80 TDP1 (0.41) TDP1TP53CASRCYP1A2CYP2A6
SCHEMBL3655726 0.80 TDP1 (0.41) TDP1TP53CASRCYP1A2CYP2A6
SCHEMBL7610097 0.80 TDP1 (0.46) TDP1TP53CASRCYP1A2CYP2A6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5210353-A Transarylalkylation AMOCO CORPORATION (US) 1993-05-11 US claimed
EP-3133444-A1 CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND OSAKA UNIVERSITY (JP) 2017-02-22 EP disclosed
EP-0564979-B1 Method for the production of dixylylpropane HOECHST AG (DE) 1996-08-28 EP disclosed
EP-0499925-B1 Process for the preparation of 2,2-Bis-(3,4-Dimethyl-Phenyl)-propane BAYER AG (DE) 1995-10-18 EP disclosed
US-5300717-A Reacting o-xylene with propene; Friedel-Crafts catalyst; dehydrogenation. chlorination, condensation; intermediate for bisanhydride precursor for polyimides HOECHST AKTIENGESELLSCHAFT (DE) 1994-04-05 US disclosed
EP-0564979-A2 Method for the production of dixylylpropane HOECHST AKTIENGESELLSCHAFT (DE) 1993-10-13 EP disclosed
US-5210353-A Transarylalkylation AMOCO CORPORATION (US) 1993-05-11 US disclosed
EP-0499925-A1 Process for the preparation of 2,2-Bis-(3,4-Dimethyl-Phenyl)-propane BAYER AG (DE) 1992-08-26 EP disclosed