⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17289066 | 1.00 | — | — | |
| SCHEMBL14562054 | 1.00 | — | — | |
| SCHEMBL13247116 | 0.82 | — | — | |
| SCHEMBL17350479 | 0.80 | — | — | |
| SCHEMBL25467622 | 0.79 | — | — | |
| SCHEMBL20686797 | 0.78 | — | — | |
| SCHEMBL27725367 | 0.78 | ANPEP (0.31) | — | |
| SCHEMBL6939628 | 0.78 | TSHR (0.33) | — | |
| SCHEMBL422022 | 0.73 | — | — | |
| SCHEMBL799216 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 247 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12325844-B2 | Photoresist remover | VERSUM MATERIALS US, LLC (US) | 2025-06-10 | — | — | US | claimed |
| WO-2025108836-A1 | COMPOSITIONS FOR REMOVING PHOTORESIST AND ETCH RESIDUES, METHODS OF USING AND USE THEREOF | MERCK PATENT GMBH (DE) | 2025-05-30 | — | — | WO | claimed |
| WO-2025053791-A1 | ONE-POT GRAFTING OF POLYMERS FROM ALCOHOLS AND BIOMASSES | NANYANG TECHNOLOGICAL UNIVERSITY (SG) | 2025-03-13 | — | — | WO | claimed |
| US-20220333044-A1 | Photoresist Remover | VERSUM MATERIALS US, LLC (US) | 2022-10-20 | — | — | US | claimed |
| EP-4038173-A1 | PHOTORESIST REMOVER | Versum Materials US, LLC (US) | 2022-08-10 | — | — | EP | claimed |
| CN-114502708-A | Photoresist remover | 弗萨姆材料美国有限责任公司 | 2022-05-13 | — | — | CN | claimed |
| CN-112859554-A | Vanadium oxide corrosion-inhibition fluorine-containing stripping liquid, preparation method and application thereof | 上海新阳半导体材料股份有限公司 | 2021-05-28 | — | — | CN | claimed |
| CN-112859553-A | Vanadium oxide corrosion-inhibition fluorine-containing stripping liquid, preparation method and application thereof | 上海新阳半导体材料股份有限公司 | 2021-05-28 | — | — | CN | claimed |
| CN-112859552-A | Vanadium oxide corrosion-inhibition fluorine-containing stripping liquid, preparation method and application thereof | 上海新阳半导体材料股份有限公司 | 2021-05-28 | — | — | CN | claimed |
| WO-2021067147-A1 | PHOTORESIST REMOVER | VERSUM MATERIALS US, LLC (US) | 2021-04-08 | — | — | WO | claimed |
| CN-102666745-B | Conductive ink composition without forming particles and method for producing same | DONGJIN SEMICHEM CO LTD | 2015-03-25 | — | — | CN | claimed |
| US-8987181-B2 | Photoresist and post etch residue cleaning solution | DYNALOY, LLC (US) | 2015-03-24 | — | — | US | claimed |
| EP-2758507-A1 | PROCESS AND COMPOSITION FOR REMOVING SUBSTANCES FROM SUBSTRATES | Dynaloy, LLC (US) | 2014-07-30 | — | — | EP | claimed |
| WO-2014081465-A1 | PROCESS AND COMPOSITION FOR REMOVING SUBSTANCES FROM SUBSTRATES | DYNALOY, LLC (US) | 2014-05-30 | — | — | WO | claimed |
| US-20140142017-A1 | Process And Composition For Removing Substances From Substrates | DYNALOY, LLC (US) | 2014-05-22 | — | — | US | claimed |
| CN-102666745-A | Conductive ink composition without forming particles and method for producing same | DONGJIN SEMICHEM CO LTD | 2012-09-12 | — | — | CN | claimed |
| EP-1031884-B1 | Resist stripping agent and process of producing semiconductor devices using the same | MITSUBISHI GAS CHEMICAL CO (JP) | 2012-01-11 | — | — | EP | claimed |
| US-7968507-B2 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-06-28 | — | — | US | claimed |
| US-20110028562-A1 | DERIVATIVES OF AMINOALKANOLS, METHOD OF OBTAINING OF AMINOALKANOLS AND THEIR USE | UNIWERSYTET JAGIELLONSKI (PL) | 2011-02-03 | — | — | US | claimed |
| US-20090084406-A1 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. | 2009-04-02 | — | — | US | claimed |