Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9074721 | 0.76 | CYP19A1 (0.33) | CYP19A1 | |
| SCHEMBL2036437 | 0.74 | KDM4E (0.33) | — | |
| SCHEMBL11039058 | 0.70 | ALDH1A1 (0.31) | CYP19A1 | |
| SCHEMBL5609964 | 0.67 | — | — | |
| SCHEMBL14101249 | 0.67 | ALDH1A1 (0.37) | TYR | |
| SCHEMBL15959945 | 0.67 | — | — | |
| SCHEMBL11321650 | 0.65 | FASN (0.31) | — | |
| SCHEMBL9073056 | 0.65 | ALDH1A1 (0.31) | CYP19A1 | |
| SCHEMBL20269352 | 0.65 | ALDH1A1 (0.31) | CYP19A1TYR | |
| SCHEMBL16582570 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090117346-A1 | PHOTOSENSITIVE MATERIAL FOR FORMING CONDUCTIVE FILM, CONDUCTIVE FILM, LIGHT TRANSMITTING ELECTROMAGNETIC WAVE SHIELDING FILM AND METHOD FOR MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2009-05-07 | — | — | US | disclosed |
| US-20090117346-A1 | PHOTOSENSITIVE MATERIAL FOR FORMING CONDUCTIVE FILM, CONDUCTIVE FILM, LIGHT TRANSMITTING ELECTROMAGNETIC WAVE SHIELDING FILM AND METHOD FOR MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2009-05-07 | — | — | US | disclosed |
| US-20090098480-A1 | PHOTOSENSITIVE MATERIAL FOR FORMING CONDUCTIVE FILM, CONDUCTIVE FILM, LIGHT TRANSMITTING ELECTROMAGNETIC WAVE SHIELDING FILM AND METHOD FOR MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-16 | — | — | US | disclosed |
| US-20090098480-A1 | PHOTOSENSITIVE MATERIAL FOR FORMING CONDUCTIVE FILM, CONDUCTIVE FILM, LIGHT TRANSMITTING ELECTROMAGNETIC WAVE SHIELDING FILM AND METHOD FOR MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-16 | — | — | US | disclosed |
| US-20090098481-A1 | PHOTOSENSITIVE MATERIAL FOR FORMING CONDUCTIVE FILM, CONDUCTIVE FILM, LIGHT TRANSMITTING ELECTROMAGNETIC WAVE SHIELDING FILM AND METHOD FOR MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-16 | — | — | US | disclosed |
| US-20090098481-A1 | PHOTOSENSITIVE MATERIAL FOR FORMING CONDUCTIVE FILM, CONDUCTIVE FILM, LIGHT TRANSMITTING ELECTROMAGNETIC WAVE SHIELDING FILM AND METHOD FOR MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-16 | — | — | US | disclosed |
| US-20090029125-A1 | PHOTOSENSITIVE MATERIAL FOR FORMING CONDUCTIVE FILM, CONDUCTIVE FILM, LIGHT TRANSMITTING ELECTROMAGNETIC WAVE SHIELDING FILM AND METHOD FOR MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2009-01-29 | — | — | US | disclosed |
| US-20090029125-A1 | PHOTOSENSITIVE MATERIAL FOR FORMING CONDUCTIVE FILM, CONDUCTIVE FILM, LIGHT TRANSMITTING ELECTROMAGNETIC WAVE SHIELDING FILM AND METHOD FOR MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2009-01-29 | — | — | US | disclosed |
| US-7332265-B2 | Silver halide color photographic light-sensitive material, and image-forming method | FUJIFILM CORPORATION (JP) | 2008-02-19 | — | — | US | disclosed |
| US-7332265-B2 | Silver halide color photographic light-sensitive material, and image-forming method | FUJIFILM CORPORATION (JP) | 2008-02-19 | — | — | US | disclosed |
| EP-0692732-A1 | Thermally processable image-recording material including reductone developing agent | POLAROID CORPORATION (US) | 1996-01-17 | — | — | EP | disclosed |
| US-5427905-A | Thermally processable image-recording material including reductone developing agent | POLAROID CORPORATION (US) | 1995-06-27 | — | — | US | disclosed |