SCHEMBL909714

SCHEMBL909714

CC(C)(Cl)O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1223908 0.82
SCHEMBL1532621 0.72 TSHR (0.33)
SCHEMBL5010089 0.72 TSHR (0.33)
SCHEMBL51455 0.70
SCHEMBL129383 0.70
SCHEMBL10389414 0.68
SCHEMBL10904232 0.67
SCHEMBL18813463 0.67
SCHEMBL7028983 0.67
SCHEMBL6910761 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117925151-A High-temperature-resistant pressure-sensitive adhesive and preparation method and application thereof 浙江离火新材料科技有限公司 2024-04-26 CN claimed
US-5599387-A VAPOR FOR PYROLYTIC DEPOSITION OF SILICON DIOXIDE COMPRISING CARRIER GAS, SOURCE OF OXYGEN, SILICON COMPOUND HAVING SIICON-OXYGEN BOND PPG INDUSTRIES, INC. (US) 1997-02-04 US claimed
CN-117925151-A High-temperature-resistant pressure-sensitive adhesive and preparation method and application thereof 浙江离火新材料科技有限公司 2024-04-26 CN disclosed
WO-2020184996-A2 LIGHT-SINTERING COPPER PRECURSOR, MANUFACTURING METHOD THEREFOR, AND LIGHT-SINTERING METHOD THERFOR 한양대학교 산학협력단 2020-09-17 WO disclosed
EP-2857436-B1 POLYMER HAVING TERMINAL STRUCTURE INCLUDING PLURALITY OF REACTIVE SILICON GROUPS, METHOD FOR MANUFACTURING SAME, AND USE FOR SAME KANEKA CORP (JP) 2019-10-09 EP disclosed
EP-3021948-B1 OIL/OIL EMULSIONS CONTAINING PARTICLES WITH A BREAKAGE OF CURVATURE, COMPOSITIONS COMPRISING THEM AND USE OF THE PARTICLES FOR STABILIZING O/O EMULSIONS OREAL (FR) 2019-08-21 EP disclosed
US-9969843-B2 Polymer having terminal structure including plurality of reactive silicon groups, method for manufacturing same, and use for same KANEKA CORPORATION (JP) 2018-05-15 US disclosed
US-9803052-B2 Polymer having terminal structure including plurality of reactive silicon groups, method for manufacturing same, and use for same KANEKA CORPORATION (JP) 2017-10-31 US disclosed
EP-2251038-B1 SOLID DISPERSION, PHARMACEUTICAL COMPOSITIONS CONTAINING THE SAME, AND PROCESSES FOR THE PRODUCTION OF BOTH ASKA PHARM CO LTD (JP) 2017-05-10 EP disclosed
US-20170051108-A1 POLYMER HAVING TERMINAL STRUCTURE INCLUDING PLURALITY OF REACTIVE SILICON GROUPS, METHOD FOR MANUFACTURING SAME, AND USE FOR SAME KANEKA CORPORATION (JP) 2017-02-23 US disclosed
US-20170044314-A1 POLYMER HAVING TERMINAL STRUCTURE INCLUDING PLURALITY OF REACTIVE SILICON GROUPS, METHOD FOR MANUFACTURING SAME, AND USE FOR SAME KANEKA CORPORATION (JP) 2017-02-16 US disclosed
US-5776236-A INCRESED DEPOSITION RATE PPG INDUSTRIES, INC. (US) 1998-07-07 US disclosed
EP-0627391-B1 Neutral, low emissivity coated glass articles and method for making PPG INDUSTRIES INC (US) 1997-07-16 EP disclosed
US-5599387-A VAPOR FOR PYROLYTIC DEPOSITION OF SILICON DIOXIDE COMPRISING CARRIER GAS, SOURCE OF OXYGEN, SILICON COMPOUND HAVING SIICON-OXYGEN BOND PPG INDUSTRIES, INC. (US) 1997-02-04 US disclosed
US-5464657-A Vaporization and coating PPG INDUSTRIES, INC. (US) 1995-11-07 US disclosed
EP-0627391-A1 Neutral, low emissivity coated glass articles and method for making PPG INDUSTRIES, INC. (US) 1994-12-07 EP disclosed
US-5356718-A Amorphous; mixed oxides dispersed with elemental phosphorus, aluminum or boron PPG INDUSTRIES, INC. (US) 1994-10-18 US disclosed
EP-0611733-A2 Coating apparatus, method of coating glass, compounds and compositions for coating glass and coated glass substrates PPG INDUSTRIES, INC. (US) 1994-08-24 EP disclosed
EP-0206621-B1 PROCESS FOR DISPROPORTIONATING SILANES MITSUI TOATSU CHEMICALS, Inc. (JP) 1989-11-15 EP disclosed
EP-0206621-A1 Process for disproportionating silanes MITSUI TOATSU CHEMICALS, Inc. (JP) 1986-12-30 EP disclosed