⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28426858 | 0.78 | — | — | |
| SCHEMBL1463703 | 0.77 | ALDH1A1 (0.31) | — | |
| SCHEMBL9355022 | 0.76 | — | — | |
| SCHEMBL10704564 | 0.75 | ALDH1A1 (0.34) | — | |
| SCHEMBL8721312 | 0.73 | — | — | |
| SCHEMBL17063465 | 0.72 | — | — | |
| SCHEMBL7525982 | 0.71 | ALDH1A1 (0.31) | — | |
| SCHEMBL28134163 | 0.68 | — | — | |
| SCHEMBL28855146 | 0.66 | — | — | |
| SCHEMBL24760387 | 0.64 | GAA (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0362649-B1 | Radiation-sensitive compositions and their use | BASF AG (DE) | 1994-03-02 | — | — | EP | claimed |
| US-5284734-A | Insulating layers and printed circuits; precursors for polyimides and polyquinazolines | BASF AKTIENGESELLSCHAFT (DE) | 1994-02-08 | — | — | US | claimed |
| EP-0362649-A2 | Radiation-sensitive compositions and their use | BASF Aktiengesellschaft (DE) | 1990-04-11 | — | — | EP | claimed |
| US-5493003-A | MIXTURES OF AMINES, AMIDES AND/OR ESTERS OF TETRACARBOXYLIC ACIDS HAVING AMIDO OR ESTER GROUPS SUBSTITUTED WITH CARBOXYL, SULFO, SILYL OR SILOXY GROUPS, ELECTRONICS | BASF LACKE + FARBEN AKTIENGESELLSCHAFT (DE) | 1996-02-20 | — | — | US | disclosed |
| US-5478917-A | Aromatic polyamines, tetracarboxylic acid amides and esters; smoothness, flexibility | BASF LACKE + FARBEN AKTIENGESELLSCHAFT (DE) | 1995-12-26 | — | — | US | disclosed |
| US-5474876-A | Carboxyl-containing polymeric precursor of heterocyclic polymer which is stable at high temperatures and soluble in polar solvents, copolymerizable unsaturated tertiary sulfonium salt, photoinitiator, polar aprotic organic solvent | BASF LACKE + FARBEN AG (DE) | 1995-12-12 | — | — | US | disclosed |
| EP-0573866-B1 | Method for forming patterned layers of heat-resistant polycondensates | BASF LACKE & FARBEN (DE) | 1994-11-02 | — | — | EP | disclosed |
| US-5350663-A | Construction of electrical circuits and protective or insulating layers for electronic components | BASF LACKE+ FARBEN AKTIENGESELLSCHAFT (DE) | 1994-09-27 | — | — | US | disclosed |
| EP-0362649-B1 | Radiation-sensitive compositions and their use | BASF AG (DE) | 1994-03-02 | — | — | EP | disclosed |
| US-5284734-A | Insulating layers and printed circuits; precursors for polyimides and polyquinazolines | BASF AKTIENGESELLSCHAFT (DE) | 1994-02-08 | — | — | US | disclosed |
| EP-0573866-A1 | Method for forming patterned layers of heat-resistant polycondensates | BASF Lacke + Farben Aktiengesellschaft (DE) | 1993-12-15 | — | — | EP | disclosed |
| EP-0362649-A2 | Radiation-sensitive compositions and their use | BASF Aktiengesellschaft (DE) | 1990-04-11 | — | — | EP | disclosed |