⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2797217 | 0.84 | — | — | |
| SCHEMBL11054232 | 0.81 | — | — | |
| SCHEMBL5194158 | 0.75 | — | — | |
| SCHEMBL9014198 | 0.75 | — | — | |
| SCHEMBL9584717 | 0.73 | — | — | |
| SCHEMBL14639748 | 0.58 | — | — | |
| SCHEMBL6160898 | 0.58 | — | — | |
| SCHEMBL2797424 | 0.56 | — | — | |
| SCHEMBL12330309 | 0.55 | — | — | |
| SCHEMBL25351987 | 0.53 | ALDH1A1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9219123-B2 | Method of producing a nitride semiconductor crystal with precursor containing carbon and oxygen, and nitride semiconductor crystal and semiconductor device made by the method | SHARP KABUSHIKI KAISHA (JP) | 2015-12-22 | — | — | US | disclosed |
| US-8772277-B2 | Nitrogen-containing heterocyclic compound | TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) | 2014-07-08 | — | — | US | disclosed |
| US-20140145202-A1 | NITRIDE SEMICONDUCTOR CRYSTAL | SHARP KABUSHIKI KAISHA (JP) | 2014-05-29 | — | — | US | disclosed |
| CN-101969920-B | Parakeratosis inhibitor, pore shrinking agent or agent for preventing or improving rough skin, and composition for external use on the skin containing the same | SHISEIDO CO LTD | 2013-09-18 | — | — | CN | disclosed |
| US-20130072467-A1 | NITROGEN-CONTAINING HETEROCYCLIC COMPOUND | TAKEDA PHARMACEUTICAL COMPANY LIMITED | 2013-03-21 | — | — | US | disclosed |
| US-20130040951-A9 | PROPHYLACTIC OR THERAPEUTIC AGENT FOR CANCER | TAKEDA PHARMACEUTICAL COMPANY LIMITED | 2013-02-14 | — | — | US | disclosed |
| WO-2013018929-A1 | NITROGEN-CONTAINING HETEROCYCLIC COMPOUND | TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) | 2013-02-07 | — | — | WO | disclosed |
| EP-2530078-A1 | THIAZOLE DERIVATIVE | Takeda Pharmaceutical Company Limited (JP) | 2012-12-05 | — | — | EP | disclosed |
| US-20120208781-A1 | AMINOGLYCOSIDE DOSING REGIMENS | ACHAOGEN, INC. (US) | 2012-08-16 | — | — | US | disclosed |
| US-20120196864-A1 | PROPHYLACTIC OR THERAPEUTIC AGENT FOR CANCER | TAKEDA PHARMACEUTICAL COMPANY LIMITED | 2012-08-02 | — | — | US | disclosed |
| EP-2450352-A1 | PROPHYLACTIC OR THERAPEUTIC AGENT FOR CANCER | Takeda Pharmaceutical Company Limited (JP) | 2012-05-09 | — | — | EP | disclosed |
| CN-101979403-A | Novel broad caspase inhibitor and preparation method and application thereof | LINGLING SHEN | 2011-02-23 | — | — | CN | disclosed |
| CN-101969920-A | Parakeratosis inhibitor, pore shrinking agent or agent for preventing or improving rough skin, and composition for external use on the skin containing the same | SHISEIDO CO LTD | 2011-02-09 | — | — | CN | disclosed |
| US-20110004019-A1 | Parakeratosis Inhibitor, Pore-Shrinking Agent, Or Rough Skin Inhibiting/Ameliorating Agent, And External Composition For Skin Containing The Same | SHISEIDO COMPANY LTD. (JP) | 2011-01-06 | — | — | US | disclosed |
| EP-2255780-A1 | PARAKERATOSIS INHIBITOR, PORE SHRINKING AGENT OR AGENT FOR PREVENTING OR IMPROVING ROUGH SKIN, AND COMPOSITION FOR EXTERNAL USE ON THE SKIN CONTAINING THE SAME | Shiseido Company, Ltd. (JP) | 2010-12-01 | — | — | EP | disclosed |