SCHEMBL9105772

SCHEMBL9105772

CC(C)=CCc1cc(C)ccc1SC(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HTT P42858 3/20 0.35
▸ HPGD P15428 2/20 0.33
▸ SRC P12931 1/20 0.33
▸ PTGS1 P23219 1/20 0.33
▸ PTGS2 P35354 1/20 0.33
▸ ALDH1A1 P00352 1/20 0.33
▸ MEN1 O00255 2/20 0.33
▸ KMT2A Q03164 2/20 0.33
▸ CYP1A2 P05177 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ CYP2D6 P10635 1/20 0.33
▸ CYP2C9 P11712 1/20 0.33
▸ CYP2C19 P33261 1/20 0.33
▸ SMN1; SMN2 Q16637 1/20 0.33
▸ NPSR1 Q6W5P4 1/20 0.33
▸ FFAR4 Q5NUL3 4/20 0.32
▸ FFAR1 O14842 3/20 0.32
▸ AKR1C3 P42330 3/20 0.31
▸ AKR1B10 O60218 2/20 0.31
▸ AKR1B1 P15121 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21363082 0.74 HTT (0.41) HTTHPGDSRCPTGS1PTGS2
SCHEMBL10909378 0.72 HTT (0.62) HTTHPGDSRCPTGS1PTGS2
SCHEMBL17887931 0.71 GRIN2D (0.43) HPGD
SCHEMBL10987403 0.69 HAO1 (0.40) HPGDPTGS1PTGS2ALDH1A1MEN1
SCHEMBL24804434 0.68 HTT (0.50) HTTHPGDSRCPTGS1PTGS2
SCHEMBL18123531 0.68 CYP19A1 (0.47) PTGS2ALDH1A1CYP3A4AKR1C3
SCHEMBL900649 0.68 PDE2A (0.47) HPGDMEN1KMT2AHTR2AHTR2C
SCHEMBL11469504 0.67 HTT (0.41) HTTHPGDSRCPTGS1PTGS2
SCHEMBL900763 0.67 HTR2A (0.35) FFAR4FFAR1HTR2AHTR2CHTR2B
SCHEMBL12828097 0.66 CYP3A4 (0.36) HPGDMEN1KMT2ACYP1A2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2460802-A1 TRIFLUOROMETHYLTHIOPHENIUM DERIVATIVE SALTS, PROCESS FOR PRODUCITON THEREOF, AND PROCESS FOR PRODUCTION OF TRIFLUOROMETHYL-CONTAINING COMPOUNDS USING SAME Nagoya Institute of Technology (JP) 2012-06-06 — — EP disclosed
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