⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9472380 | 0.86 | — | — | |
| SCHEMBL11207155 | 0.80 | — | — | |
| Fluoride Ion SCHEMBL4256732 | 0.80 | — | — | |
| Hydrochloric Acid SCHEMBL149703 | 0.80 | — | — | |
| Water SCHEMBL380414 | 0.80 | — | — | |
| SCHEMBL11690985 | 0.70 | — | — | |
| SCHEMBL339308 | 0.68 | — | — | |
| SCHEMBL20952201 | 0.68 | ALDH1A1 (0.30) | — | |
| SCHEMBL2384789 | 0.68 | ALDH1A1 (0.30) | — | |
| SCHEMBL20582613 | 0.68 | ALDH1A1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 266 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5264547-A | Optically active ether lactone, optically active polymer thereof, and process for producing the polymer | TAKASAGO INTERNATIONAL CORPORATION (JP) | 1993-11-23 | — | — | US | claimed |
| US-12637599-B2 | Two-component polyurethane adhesive composition for film lamination in hot filling application | HENKEL AG & CO. KGAA (DE) | 2026-05-26 | — | — | US | disclosed |
| WO-2026105502-A1 | COMPOSITE METAL CYANIDE COMPLEX CATALYST POWDER, METHOD FOR PRODUCING POLYETHER COMPOUND, METHOD FOR PRODUCING POLYETHER COMPOUND HAVING REACTIVE SILICON GROUP, METHOD FOR PRODUCING POLYETHER COMPOUND HAVING URETHANE BOND, AND METHOD FOR PRODUCING POLYETHER COMPOUND HAVING POLYMERIZABLE UNSATURATED GROUP | ＡＧＣ株式会社 | 2026-05-21 | — | — | WO | disclosed |
| EP-4737502-A1 | METHOD FOR PRODUCING POLYETHER COMPOUND, METHOD FOR PRODUCING POLYETHER COMPOUND HAVING REACTIVE SILICON GROUP, METHOD FOR PRODUCING POLYETHER COMPOUND HAVING URETHANE BOND, AND METHOD FOR PRODUCING POLYETHER COMPOUND HAVING POLYMERIZABLE UNSATURATED GROUP | AGC INC. (JP) | 2026-05-06 | — | — | EP | disclosed |
| EP-4737503-A1 | METHOD FOR PRODUCING POLYETHER COMPOUND, METHOD FOR PRODUCING POLYETHER COMPOUND HAVING REACTIVE SILICON GROUP, METHOD FOR PRODUCING POLYETHER COMPOUND HAVING URETHANE BOND, AND METHOD FOR PRODUCING POLYETHER COMPOUND HAVING POLYMERIZABLE UNSATURATED GROUP | AGC INC. (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-20260117023-A1 | METHOD OF PRODUCING POLYETHER COMPOUND, METHOD OF PRODUCING POLYETHER COMPOUND CONTAINING REACTIVE SILICON GROUP, METHOD OF PRODUCING POLYETHER COMPOUND HAVING URETHANE BOND, AND METHOD OF PRODUCING POLYETHER COMPOUND CONTAINING POLYMERIZABLE UNSATURATED GROUP | AGC Inc. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12612502-B2 | Adhesive treatment liquid, and method for treating adhesive | NITTO DENKO CORPORATION (JP) | 2026-04-28 | — | — | US | disclosed |
| US-20260109814-A1 | METHOD OF PRODUCING POLYETHER COMPOUND, METHOD OF PRODUCING POLYETHER COMPOUND CONTAINING REACTIVE SILICON GROUP, METHOD OF PRODUCING POLYETHER COMPOUND HAVING URETHANE BOND, AND METHOD OF PRODUCING POLYETHER COMPOUND CONTAINING POLYMERIZABLE UNSATURATED GROUP | AGC Inc. (JP) | 2026-04-23 | — | — | US | disclosed |
| EP-4729559-A1 | COMPOSITION, METHOD FOR PRODUCING POLYETHER COMPOUND HAVING REACTIVE SILICON GROUP, METHOD FOR PRODUCING POLYETHER COMPOUND HAVING URETHANE BOND, AND METHOD FOR PRODUCING POLYETHER COMPOUND HAVING POLYMERIZABLE UNSATURATED GROUP | AGC INC. (JP) | 2026-04-22 | — | — | EP | disclosed |
| EP-4729560-A1 | COMPOSITE METAL CYANIDE COMPLEX CATALYST, METHOD FOR PRODUCING POLYETHER COMPOUND, METHOD FOR PRODUCING POLYETHER COMPOUND HAVING REACTIVE SILICON GROUP, METHOD FOR PRODUCING POLYETHER COMPOUND HAVING URETHANE BOND, AND METHOD FOR PRODUCING POLYETHER COMPOUND HAVING POLYMERIZABLE UNSATURATED GROUP | AGC INC. (JP) | 2026-04-22 | — | — | EP | disclosed |
| US-20090012258-A1 | Process for producing urethane resin and pressure-sensitive adhesive | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20080312386-A1 | PROCESS FOR PRODUCTION OF URETHANE RESIN AND ADHESIVE AGENT | ASAHI GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |
| EP-1983012-A1 | PROCESS FOR PRODUCTION OF URETHANE RESIN AND ADHESIVE AGENT | Asahi Glass Company, Limited (JP) | 2008-10-22 | — | — | EP | disclosed |
| EP-1813631-A1 | PROCESS FOR PRODUCING URETHANE RESIN AND PRESSURE-SENSITIVE ADHESIVE | Asahi Glass Company, Limited (JP) | 2007-08-01 | — | — | EP | disclosed |
| US-20030225239-A1 | Michael addition type urethane urea resin, production process therefor, adhesive, production process therefor, coating agent for forming ink receiving layer and recording material | TOYO INK MANUFACTURING CO., LTD. (JP) | 2003-12-04 | — | — | US | disclosed |
| EP-1146061-A1 | MICHAEL ADDITION TYPE URETHANE-UREA RESIN, PROCESS FOR PRODUCING THE SAME, PRESSURE-SENSITIVE ADHESIVE, PROCESS FOR PRODUCING THE SAME, COATING MATERIAL FOR FORMING INK-RECEIVING LAYER, AND RECORDING MATERIAL | Toyo Ink Manufacturing Co. Ltd. (JP) | 2001-10-17 | — | — | EP | disclosed |
| US-5264547-A | Optically active ether lactone, optically active polymer thereof, and process for producing the polymer | TAKASAGO INTERNATIONAL CORPORATION (JP) | 1993-11-23 | — | — | US | disclosed |
| US-5221755-A | Optically active ether lactone, optically active polymer thereof, and process for producing the polymer | TAKASAGO INTERNATIONAL CORPORATION (JP) | 1993-06-22 | — | — | US | disclosed |
| US-4399272-A | COPOLYMERIZING FORMALDEHYDE AND AN ALKYLENE OXIDE OR CYCLIC FORMAL USING A LEWIS ACID AND ANIONIC CATALYST | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1983-08-16 | — | — | US | disclosed |
| US-4038304-A | URETHANE PREPOLYMER | TAKEDA CHEMICAL INDUSTRIES, LTD. (JA) | 1977-07-26 | — | — | US | disclosed |