⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10581464 | 0.76 | NOS3 (0.31) | — | |
| SCHEMBL10879683 | 0.67 | — | — | |
| SCHEMBL9766106 | 0.65 | — | — | |
| SCHEMBL13451121 | 0.63 | — | — | |
| SCHEMBL8216638 | 0.63 | — | — | |
| SCHEMBL10985274 | 0.62 | — | — | |
| SCHEMBL10985271 | 0.62 | — | — | |
| SCHEMBL10985269 | 0.62 | — | — | |
| SCHEMBL2692353 | 0.62 | — | — | |
| SCHEMBL23234604 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117343638-A | Porous spin-on dielectric coating materials from silicon-containing polymers | 上海艾深斯科技有限公司 | 2024-01-05 | — | — | CN | disclosed |
| EP-4045095-B1 | IRON (III) COMPLEXES WITH NOVEL CONTRAST PROPERTIES FOR MAGNETIC RESONANCE IMAGING | UNIV BERLIN CHARITE (DE) | 2023-08-02 | — | — | EP | disclosed |
| EP-3808381-A1 | IRON (III) COMPLEXES WITH NOVEL CONTRAST PROPERTIES FOR MAGNETIC RESONANCE IMAGING | Charité - Universitätsmedizin Berlin (DE) | 2021-04-21 | — | — | EP | disclosed |
| CN-102319184-B | Parakeratosis inhibitor, pore-shrinking agent and external composition for skin | SHISEIDO CO LTD | 2015-03-25 | — | — | CN | disclosed |
| US-8937090-B2 | Parakeratosis inhibitor, pore-shrinking agent and external composition for skin | SHISEIDO COMPANY, LTD. (JP) | 2015-01-20 | — | — | US | disclosed |
| CN-101969920-B | Parakeratosis inhibitor, pore shrinking agent or agent for preventing or improving rough skin, and composition for external use on the skin containing the same | SHISEIDO CO LTD | 2013-09-18 | — | — | CN | disclosed |
| US-20120232111-A1 | Parakeratosis inhibitor, pore -shrinking agent and external compositon for skin | SHISEIDO COMPANY, LTD. (JP) | 2012-09-13 | — | — | US | disclosed |
| US-20120165409-A1 | WRINKLE-IMPROVING AGENT | SHISEIDO COMPANY, LTD. (JP) | 2012-06-28 | — | — | US | disclosed |
| CN-101175470-B | Parakeratosis inhibitor, pore-shrinking agent and external composition for skin | SHISEIDO CO LTD | 2011-09-14 | — | — | CN | disclosed |
| CN-101267803-B | Wrinkle-improving agent | SHISEIDO CO LTD | 2011-06-08 | — | — | CN | disclosed |
| CN-101969920-A | Parakeratosis inhibitor, pore shrinking agent or agent for preventing or improving rough skin, and composition for external use on the skin containing the same | SHISEIDO CO LTD | 2011-02-09 | — | — | CN | disclosed |
| US-20110004019-A1 | Parakeratosis Inhibitor, Pore-Shrinking Agent, Or Rough Skin Inhibiting/Ameliorating Agent, And External Composition For Skin Containing The Same | SHISEIDO COMPANY LTD. (JP) | 2011-01-06 | — | — | US | disclosed |
| EP-2255780-A1 | PARAKERATOSIS INHIBITOR, PORE SHRINKING AGENT OR AGENT FOR PREVENTING OR IMPROVING ROUGH SKIN, AND COMPOSITION FOR EXTERNAL USE ON THE SKIN CONTAINING THE SAME | Shiseido Company, Ltd. (JP) | 2010-12-01 | — | — | EP | disclosed |
| US-20100035881-A1 | WRINKLE-IMPROVING AGENT | SHISEIDO COMPANY, LTD. (JP) | 2010-02-11 | — | — | US | disclosed |
| CN-101267803-A | Wrinkle-improving agent | SHISEIDO CO LTD (JP) | 2008-09-17 | — | — | CN | disclosed |
| EP-1941861-A1 | WRINKLE-IMPROVING AGENT | Shiseido Company, Limited (JP) | 2008-07-09 | — | — | EP | disclosed |
| CN-101175470-A | Parakeratosis inhibitor, pore-shrinking agent and external composition for skin | SHISEIDO CO LTD (JP) | 2008-05-07 | — | — | CN | disclosed |
| EP-1880711-A1 | PARAKERATOSIS INHIBITOR, PORE-SHRINKING AGENT AND EXTERNAL COMPOSITION FOR SKIN | Shiseido Company, Limited (JP) | 2008-01-23 | — | — | EP | disclosed |