⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Di(Hydroxyethyl)Ether SCHEMBL9447825 | 1.00 | TSHR (0.67) | — | |
| Triethylene Glycol SCHEMBL9447828 | 0.97 | MEN1 (0.69) | — | |
| SCHEMBL3861837 | 0.97 | MEN1 (0.69) | — | |
| SCHEMBL315062 | 0.97 | MEN1 (0.69) | — | |
| SCHEMBL2477057 | 0.97 | MEN1 (0.69) | — | |
| SCHEMBL2474236 | 0.97 | MEN1 (0.69) | — | |
| Ethylene Glycol SCHEMBL9788560 | 0.90 | TSHR (0.50) | — | |
| Ethylene Glycol SCHEMBL11794048 | 0.90 | TSHR (0.50) | — | |
| 2-Chloroethanol SCHEMBL11553025 | 0.90 | TSHR (0.50) | — | |
| Dimethylamine SCHEMBL28297119 | 0.87 | MEN1 (0.55) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2257 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122071652-A | Natural gas desulfurizing agent and preparation method and application thereof | 中国石油天然气股份有限公司 | 2026-05-22 | — | — | CN | claimed |
| CN-119569707-B | DEG-PTD ligand, preparation method and application thereof, and method for separating lanthanoid and actinoid from waste liquid | 兰州大学 | 2026-02-27 | — | — | CN | claimed |
| EP-4638658-A1 | PYROLYSIS OIL PURIFICATION USING SUCCESSIVE EXTRACTIONS | SABIC Global Technologies B.V. (NL) | 2025-10-29 | — | — | EP | claimed |
| CN-120136811-A | Azobenzothiazole compound, and preparation method and application thereof | 四川大学 | 2025-06-13 | — | — | CN | claimed |
| CN-120139023-A | Preparation method of wet toilet paper | 安徽云之雨日化用品有限公司 | 2025-06-13 | — | — | CN | claimed |
| CN-120136813-A | Deuterium-labeled quetiapine fumarate isotope compound, preparation method thereof and food detection method | 曼哈格(上海)生物科技有限公司 | 2025-06-13 | — | — | CN | claimed |
| CN-119615135-B | Electroless copper plating additive, electroless copper plating solution and electroless copper plating method for IC carrier plate | 深圳市板明科技股份有限公司 | 2025-05-27 | — | — | CN | claimed |
| CN-116314835-B | Carbon-coated aluminum foil with good heat conducting performance | 鼎圭新材料科技(上海)有限公司 | 2025-05-23 | — | — | CN | claimed |
| CN-119930409-A | Method for preparing 2-chloroethoxy ethanol by combined catalysis | 苏州敬业医药化工有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-118689048-B | Low-content NMF photoresist stripping liquid and preparation method thereof | 惠州达诚微电子材料有限公司 | 2025-04-15 | — | — | CN | claimed |
| EP-0798036-B1 | Highly permeable composite reverse osmosis membrane and a reverse osmosis membrane module using the same | NITTO DENKO CORP (JP) | 2003-09-24 | — | — | EP | claimed |
| US-6060612-A | SKIN CARE COSMETIC | PACIFIC CORPORATION (KR) | 2000-05-09 | — | — | US | claimed |
| US-6024873-A | Highly permeable composite reverse osmosis membrane and a reverse osmosis membrane module using the same | NITTO DENKO CORPORATION (JP) | 2000-02-15 | — | — | US | claimed |
| EP-0798036-A2 | Highly permeable composite reverse osmosis membrane and a reverse osmosis membrane module using the same | NITTO DENKO CORPORATION (JP) | 1997-10-01 | — | — | EP | claimed |
| US-5207940-A | Compatible with polar additives | ETHYL CORPORATION (US) | 1993-05-04 | — | — | US | claimed |
| US-4820672-A | REACTING MAGNESIUM OR ORGANOMAGNESIUM COMPOUNDS, HYDROGEN CHLORIDE, CHLOROALCOHOL, BETA-ALKYL SUBSTITUTED ALCOHOLS; POLY CAT OR SUPPORTS | LITHIUM CORPORATION OF AMERICA (US) | 1989-04-11 | — | — | US | claimed |
| US-4665234-A | AMINATION OF HALOALKOXYALKANOL WITH HINDERED ALKYLAMINE | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1987-05-12 | — | — | US | claimed |
| EP-0177905-A2 | Process for the development and stripping of photoresist layers with quaternary ammonium compounds | HOECHST JAPAN KABUSHIKI KAISHA (JP) | 1986-04-16 | — | — | EP | claimed |
| EP-0084943-B1 | SECONDARY AND TERTIARY AMINO ALCOHOLS | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1986-04-02 | — | — | EP | claimed |
| EP-0084943-A2 | Secondary and tertiary amino alcohols | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1983-08-03 | — | — | EP | claimed |