SCHEMBL911171

SCHEMBL911171

CC1C=CCC=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL5769698 0.83 CA5A (0.32)
SCHEMBL767070 0.79
SCHEMBL7942416 0.74
SCHEMBL15602695 0.74
SCHEMBL16185252 0.69
SCHEMBL790973 0.69
SCHEMBL23015410 0.62
SCHEMBL4352722 0.62
SCHEMBL19258518 0.62
SCHEMBL4947433 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 153 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11987878-B2 Chemical vapor deposition processes using ruthenium precursor and reducing gas ENTEGRIS, INC. (US) 2024-05-21 US claimed
CN-112969813-B Chemical vapor deposition method using ruthenium precursor and reducing gas 恩特格里斯公司 2024-04-30 CN claimed
US-20220267895-A1 CHEMICAL VAPOR DEPOSITION PROCESSES USING RUTHENIUM PRECURSOR AND REDUCING GAS MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT 2022-08-25 US claimed
US-11371138-B2 Chemical vapor deposition processes using ruthenium precursor and reducing gas ENTEGRIS, INC. (US) 2022-06-28 US claimed
CN-113039309-A Plasma Enhanced Atomic Layer Deposition (PEALD) process using ruthenium precursors 恩特格里斯公司 2021-06-25 CN claimed
CN-112969813-A Chemical vapor deposition method using ruthenium precursor and reducing gas 恩特格里斯公司 2021-06-15 CN claimed
EP-2173922-A1 RUTHENIUM PRECURSOR WITH TWO DIFFERING LIGANDS FOR USE IN SEMICONDUCTOR APPLICATIONS L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2010-04-14 EP claimed
US-20090028745-A1 RUTHENIUM PRECURSOR WITH TWO DIFFERING LIGANDS FOR USE IN SEMICONDUCTOR APPLICATIONS L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2009-01-29 US claimed
WO-2009013721-A1 RUTHENIUM PRECURSOR WITH TWO DIFFERING LIGANDS FOR USE IN SEMICONDUCTOR APPLICATIONS L'AIR LIQUIDE-SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (US) 2009-01-29 WO claimed
WO-2008078296-A1 METHOD FOR THE DEPOSITION OF A RUTHENIUM CONTAINING FILM WITH ARYL AND DIENE CONTAINING COMPLEXES L'AIR LIQUIDE-SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2008-07-03 WO claimed
US-20080152793-A1 METHOD FOR THE DEPOSITION OF A RUTHENIUM CONTAINING FILM WITH ARYL AND DIENE CONTAINING COMPLEXES L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITAION DES PROCEDES GEORGES CLAUDE 2008-06-26 US claimed
EP-0464153-B1 DEHALOGENATION OF ORGANIC COMPOUNDS USING TIN OR LEAD UPJOHN CO (US) 1994-11-09 EP claimed
EP-0464153-A1 DEHALOGENATION OF ORGANIC COMPOUNDS USING TIN OR LEAD. UPJOHN CO (US) 1992-01-08 EP claimed
WO-1990009394-A2 DEHALOGENATION OF ORGANIC COMPOUNDS USING TIN OR LEAD THE UPJOHN COMPANY (US) 1990-08-23 WO claimed
EP-0041396-B1 DIENYL METHACRYLATES E.I. DU PONT DE NEMOURS AND COMPANY (US) 1984-03-21 EP claimed
EP-0041396-A2 Dienyl methacrylates E.I. DU PONT DE NEMOURS AND COMPANY (US) 1981-12-09 EP claimed
US-4293674-A Dienyl methacrylates E. I. DU PONT DE NEMOURS AND COMPANY (US) 1981-10-06 US claimed
US-4097661-A ORGANO-SODIUM CONTAINING ALFIN CATALYST, HYDROCARBON SOLVENT, MOLECULAR WEIGHT REGULATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JA) 1978-06-27 US claimed
EP-4724627-A1 SELECTIVE RUTHENIUM DEPOSITION AND RELATED SYSTEMS AND METHODS Entegris, Inc. (US) 2026-04-15 EP disclosed
US-3959300-A Novel indolobenzazepine derivatives, useful as tranquilizers ENDO LABORATORIES, INC. (US) 1976-05-25 US disclosed