Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13929998 | 0.86 | — | — | |
| SCHEMBL9926596 | 0.81 | KDM4E (0.33) | NPSR1KDM4EHSD17B10TDP1ALDH1A1 | |
| SCHEMBL1524655 | 0.73 | KDM4E (0.35) | NPSR1KDM4EHSD17B10TDP1ALDH1A1 | |
| SCHEMBL23319670 | 0.70 | KDM4E (0.40) | KDM4EHSD17B10TDP1ALDH1A1PKM | |
| SCHEMBL14209302 | 0.70 | CYP1A2 (0.31) | — | |
| SCHEMBL75027 | 0.69 | CYP1A2 (0.34) | — | |
| SCHEMBL13406438 | 0.68 | KDM4E (0.33) | NPSR1KDM4EHSD17B10TDP1ALDH1A1 | |
| SCHEMBL7873210 | 0.68 | — | — | |
| SCHEMBL628623 | 0.68 | — | — | |
| SCHEMBL1525295 | 0.68 | ALDH1A1 (0.36) | NPSR1KDM4EHSD17B10TDP1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8211618-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-03 | — | — | US | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-8129100-B2 | Double patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-8101341-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-24 | — | — | US | disclosed |
| US-20100304297-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100227273-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-09-09 | — | — | US | disclosed |
| US-20100178617-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-15 | — | — | US | disclosed |
| US-20100159404-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20100159392-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7700262-B2 | Top coat material and use thereof in lithography processes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-04-20 | — | — | US | disclosed |
| WO-2008121804-A1 | USE OF A COMBINATION CHAIN TRANSFER AND ACTIVATING AGENT TO CONTROL MOLECULAR WEIGHT AND OPTICAL DENSITY OF PD CATALYZED NORBORNENE POLYMERS | PROMERUS LLC (US) | 2008-10-09 | — | — | WO | disclosed |
| US-20080241736-A1 | Immersion lithography; copolymer containing ammonium salt of carboxylic acid and fluorine monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080220381-A1 | Antireflection film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-11 | — | — | US | disclosed |
| US-20080166568-A1 | TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-07-10 | — | — | US | disclosed |
| US-7368218-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-05-06 | — | — | US | disclosed |
| US-20080096131-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-24 | — | — | US | disclosed |
| US-7341818-B2 | Norbornene-type monomers and polymers containing pendent lactone or sultone groups | PROMERUS LLC (US) | 2008-03-11 | — | — | US | disclosed |
| US-7332616-B2 | Polymerizable compound, polymer, positive-resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-02-19 | — | — | US | disclosed |
| US-20080038676-A1 | TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-14 | — | — | US | disclosed |
| US-20080020290-A1 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-24 | — | — | US | disclosed |