SCHEMBL9124237

SCHEMBL9124237

C=C(C(=O)OOC(=O)C(=C)c1ccccc1)c1ccccc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 5/20 0.53
ATM Q13315 2/20 0.53
LMNA P02545 3/20 0.52
F2 P00734 1/20 0.52
ALDH1A1 P00352 5/20 0.46
TSHR P16473 4/20 0.46
CES1 P23141 3/20 0.46
CES2 O00748 2/20 0.46
DAO P14920 1/20 0.46
NAPRT Q6XQN6 1/20 0.46
MAPT P10636 5/20 0.44
AKT1 P31749 1/20 0.43
ELANE P08246 1/20 0.43
CYP3A4 P08684 2/20 0.42
CA2 P00918 2/20 0.42
CA4 P22748 2/20 0.42
HSD17B10 Q99714 2/20 0.42
POLB P06746 2/20 0.42
PARP1 P09874 1/20 0.42
CYP2C19 P33261 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL506074 0.86 TDP1 (0.53) TDP1ATMLMNAF2ALDH1A1
SCHEMBL5132603 0.84 TDP1 (0.56) TDP1ATMLMNAF2ALDH1A1
SCHEMBL2346408 0.82 MAPT (0.51) TDP1ATMLMNAF2ALDH1A1
SCHEMBL7153128 0.82 TDP1 (0.51) TDP1ATMLMNAF2ALDH1A1
SCHEMBL28712215 0.82 ATM (0.44) TDP1ATMLMNAF2ALDH1A1
SCHEMBL4211363 0.82 TDP1 (0.50) TDP1ATMLMNAF2ALDH1A1
SCHEMBL829508 0.82 TSHR (0.56) TDP1ATMLMNAF2ALDH1A1
SCHEMBL28363002 0.82 TDP1 (0.54) TDP1ATMLMNAF2ALDH1A1
SCHEMBL28968200 0.82 TDP1 (0.50) TDP1ATMLMNAF2ALDH1A1
SCHEMBL4089336 0.82 TDP1 (0.50) TDP1ATMLMNAF2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111961323-A Degradable material suitable for low-temperature well and preparation method and application thereof 上海浦景化工技术股份有限公司 2020-11-20 CN disclosed
CN-111944290-A Degradable material suitable for high-temperature well and product and application thereof 上海浦景化工技术股份有限公司 2020-11-17 CN disclosed
US-5391664-A Having hydroxyl groups at both terminals NIPPON SHOKUBAI CO., LTD. (JP) 1995-02-21 US disclosed