Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BLM | P54132 | 1/20 | 0.31 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15086625 | 0.89 | TSHR (0.43) | BLMPMP22HSD17B10MAPT | |
| SCHEMBL65880 | 0.88 | MEN1 (0.34) | BLMPMP22HSD17B10 | |
| SCHEMBL23783693 | 0.86 | BLM (0.31) | BLMPMP22HSD17B10 | |
| SCHEMBL22166141 | 0.83 | BLM (0.39) | BLMPMP22HSD17B10 | |
| SCHEMBL28986791 | 0.83 | MEN1 (0.32) | BLMPMP22HSD17B10 | |
| SCHEMBL19344639 | 0.82 | BLM (0.40) | BLMPMP22HSD17B10MAPT | |
| SCHEMBL22996250 | 0.82 | BLM (0.40) | BLMPMP22HSD17B10MAPT | |
| SCHEMBL11057871 | 0.82 | BLM (0.40) | BLMPMP22HSD17B10MAPT | |
| SCHEMBL5345639 | 0.80 | MAPT (0.36) | HSD17B10MAPT | |
| SCHEMBL8571 | 0.80 | MAPT (0.36) | HSD17B10MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8247166-B2 | Double patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-21 | — | — | US | disclosed |
| EP-2476713-A1 | Resist underlayer film composition and patterning process using the same | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-07-18 | — | — | EP | disclosed |
| EP-2474861-A1 | Resist underlayer film composition and patterning process using the same | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-07-11 | — | — | EP | disclosed |
| EP-2461214-A1 | Resist underlayer film composition and patterning process using the same | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-06-06 | — | — | EP | disclosed |
| EP-2447775-A1 | Resist underlayer film composition and patterning process using the same | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-05-02 | — | — | EP | disclosed |
| US-8129100-B2 | Double patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-20100062380-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20090253084-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |