Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | BLM | P54132 | 1/20 | 0.34 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL91262 | 0.89 | BLM (0.31) | BLMPMP22HSD17B10MAPT | |
| SCHEMBL10960986 | 0.86 | TSHR (0.48) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| SCHEMBL22166141 | 0.86 | BLM (0.39) | MEN1KMT2ABLMPMP22HSD17B10 | |
| SCHEMBL65880 | 0.86 | MEN1 (0.34) | MEN1KMT2ABLMPMP22HSD17B10 | |
| SCHEMBL23783693 | 0.84 | BLM (0.31) | BLMPMP22HSD17B10 | |
| SCHEMBL10962338 | 0.84 | MEN1 (0.50) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| SCHEMBL10963298 | 0.84 | MEN1 (0.50) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| SCHEMBL10961005 | 0.84 | MEN1 (0.50) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| SCHEMBL10961389 | 0.84 | MEN1 (0.50) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| SCHEMBL10960898 | 0.84 | MEN1 (0.50) | TSHRMAPK1MEN1KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230274936-A1 | PLANARIZING AGENT FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-31 | — | — | US | disclosed |
| US-10007183-B2 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-9977330-B2 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-22 | — | — | US | disclosed |
| US-9728420-B2 | Organic film composition, process for forming organic film, patterning process, and compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-08 | — | — | US | disclosed |
| US-20170183531-A1 | COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170184968-A1 | COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20160336189-A1 | ORGANIC FILM COMPOSITION, PROCESS FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-17 | — | — | US | disclosed |
| US-9261788-B2 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-16 | — | — | US | disclosed |
| US-20160027653-A1 | COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-28 | — | — | US | disclosed |
| US-20160018735-A1 | COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2016-01-21 | — | — | US | disclosed |
| US-9046764-B2 | Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20130171569-A1 | RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FOR RESIST UNDERLAYER FILM, AND PATTERNING PROCESS USING THE RESIST UNDERLAYER FILM COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-07-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10007183-B2 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | OR10J3, RER1, OLA1 | TSHR 4347/4885MAPK1 3110/4885MEN1 2076/4885 |
| US-20170184968-A1 | COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | CHRM1, MLX, OR10J3 | TSHR 4175/4885MAPK1 984/4885MEN1 241/4885 |
| US-20160336189-A1 | ORGANIC FILM COMPOSITION, PROCESS FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND | CHRM1, CHRM2, POF1B | TSHR 4335/4885MAPK1 3026/4885MEN1 79/4885 |
| US-20160027653-A1 | COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | OR10J3, RER1, OLA1 | TSHR 4347/4885MAPK1 3110/4885MEN1 2076/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.