Methacrylic Acid

Methacrylic Acid

SCHEMBL9136233

C=C(C)C(=O)O.C=CC(=O)OCC(F)(F)F

nearest known ligand 0.47

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Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.47
TP53 P04637 3/20 0.47
HIF1A Q16665 3/20 0.47
CYP3A4 P08684 2/20 0.47
MAPK1 P28482 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
TSHR P16473 7/20 0.40
THRB P10828 2/20 0.40
HPGD P15428 1/20 0.39
HTT P42858 1/20 0.38
HSD17B10 Q99714 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL28476192 1.00 ALDH1A1 (0.47) ALDH1A1TP53HIF1ACYP3A4MAPK1
Methacrylic Acid SCHEMBL9137100 0.91 ALDH1A1 (0.44) ALDH1A1TP53HIF1ACYP3A4MAPK1
Itaconate SCHEMBL9136633 0.89 HSD17B10 (0.49) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL30013661 0.88 ALDH1A1 (0.46) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL42473 0.87 ALDH1A1 (0.59) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL4558232 0.86 ALDH1A1 (0.44) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL29602206 0.83 ALDH1A1 (0.44) ALDH1A1TP53HIF1ACYP3A4MAPK1
Acrylic Acid Methyl Ester SCHEMBL28313078 0.81 ALDH1A1 (0.50) ALDH1A1TP53HIF1ACYP3A4MAPK1
Methacrylic Acid SCHEMBL28908234 0.81 ALDH1A1 (0.40) ALDH1A1TP53HIF1ACYP3A4MAPK1
Methacrylic Acid SCHEMBL5070592 0.81 ALDH1A1 (0.40) ALDH1A1TP53HIF1ACYP3A4MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115651582-A Preparation method of heat-conducting toughening insulating epoxy resin structural adhesive 河北工业大学 2023-01-31 CN disclosed
CN-109888385-B Electrolyte for lithium metal secondary battery and lithium metal secondary battery 厦门大学 2020-11-06 CN disclosed
CN-101203807-B Photoresist film coil and method for manufacturing the same TOKYO OHKA KOGYO CO LTD 2011-09-14 CN disclosed
CN-101203807-A Photoresist film coil and method for manufacturing the same TOKYO OHKA KOGYO CO LTD (JP) 2008-06-18 CN disclosed
US-5410005-A Comprising acrylic amide and ester copolymers and their salts, having carboxyl and sulfonic acid groups as well as fluoro JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-04-25 US disclosed
EP-0583918-A2 Reflection preventing film and process for forming resist pattern using the same JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-02-23 EP disclosed