⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11578917 | 0.87 | SPHK1 (0.30) | — | |
| SCHEMBL18948729 | 0.80 | GAA (0.31) | — | |
| SCHEMBL10587146 | 0.78 | — | — | |
| SCHEMBL18124436 | 0.77 | ALDH1A1 (0.36) | — | |
| SCHEMBL11812004 | 0.74 | EPHX1 (0.33) | — | |
| SCHEMBL9634581 | 0.74 | — | — | |
| SCHEMBL11089137 | 0.74 | — | — | |
| SCHEMBL18119747 | 0.73 | MEN1 (0.39) | — | |
| SCHEMBL11092691 | 0.72 | — | — | |
| SCHEMBL1172906 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4421844-A | COMPOUND WHICH SPLITS OFF ACID AND CLEAVABLE ETHER COMPOUND | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-12-20 | — | — | US | claimed |
| EP-0312950-B1 | Positive-working photosensitive composition containing a dye and positive-working photosensitive recording material prepared from this composition | HOECHST AG (DE) | 1995-01-04 | — | — | EP | disclosed |
| EP-0290916-B1 | Radiation-sensitive registration material | HOECHST AG (DE) | 1994-12-07 | — | — | EP | disclosed |
| EP-0332043-B1 | Oxadiazole derivatives containing 4,6-bis-trichloromethyl-s-triazin-2-yl groups, process for their preparation and photosensitive mixture containing them | HOECHST AG (DE) | 1994-05-18 | — | — | EP | disclosed |
| EP-0332044-B1 | HETEROCYCLIC COMPOUNDS CONTAINING 4,6-BIS-TRICHLOROMETHYL-S-TRIAZIN-2-YL GROUPS, PROCESS FOR THEIR PREPARATION AND PHOTOSENSITIVE MIXTURE CONTAINING THEM | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-06-16 | — | — | EP | disclosed |
| US-5216158-A | Oxadiazole compounds containing 4,6-bis-trichloromethyl-S-triazin-2-yl groups, process for their preparation | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-06-01 | — | — | US | disclosed |
| EP-0251059-B1 | PHOTOSENSITIVE REGISTRATION MATERIAL | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-07-29 | — | — | EP | disclosed |
| US-5084372-A | PROCESS FOR PREPARING PHOTOGRAPHIC ELEMENTS UTILIZING LIGHT-SENSITIVE LAYER CONTAINING CYCLICAL ACID AMIDE THERMO-CROSSLINKING COMPOUND | HOECHST CELANESE CORPORATION (US) | 1992-01-28 | — | — | US | disclosed |
| EP-0184044-B1 | LIGHT-SENSITIVE COMPOSITION, REGISTRATION MATERIAL PREPARED THEREOF, AND PROCESS FOR OBTAINING HEAT-RESISTANT RELIEF IMAGES | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-01-15 | — | — | EP | disclosed |
| US-5066567-A | IMAGE REVERSAL PROCESS UTILIZING A POSITIVE-WORKING PHOTOSENSITIVE COMPOSITION CONTAINING A DYE | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-11-19 | — | — | US | disclosed |
| EP-0137452-A1 | Light-sensitive compounds containing trichloromethyl groups, process for their preparation and light-sensitive mixture containing these compounds | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-04-17 | — | — | EP | disclosed |
| US-4510227-A | Light-sensitive aqueous developable copying material and product by coating process thereof utilizing polysiloxane and alkylene oxide copolymer as coating aid | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-04-09 | — | — | US | disclosed |
| EP-0049840-B1 | PROCESS FOR THE PRODUCTION OF RELIEF COPIES | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-01-09 | — | — | EP | disclosed |
| US-4487823-A | Light-sensitive copying material and process for the manufacture thereof utilizing non-ionic fluorinated ester surfactant | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-12-11 | — | — | US | disclosed |
| EP-0111273-A2 | Light-sensitive composition, photoprinting material prepared using that composition and processes for producing a printing plate with this material | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-06-20 | — | — | EP | disclosed |
| US-4421844-A | COMPOUND WHICH SPLITS OFF ACID AND CLEAVABLE ETHER COMPOUND | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-12-20 | — | — | US | disclosed |
| EP-0049840-A2 | Process for the production of relief copies | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-04-21 | — | — | EP | disclosed |
| EP-0042105-A1 | Photosensitive copying material and method of producing the same | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-12-23 | — | — | EP | disclosed |
| US-4189323-A | Radiation-sensitive copying composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-02-19 | — | — | US | disclosed |
| US-4101323-A | Radiation-sensitive copying composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1978-07-18 | — | — | US | disclosed |