SCHEMBL9150285

SCHEMBL9150285

CC(O)OC1CCC(O)CC1

nearest known ligand 0.34

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.34
LMNA P02545 1/20 0.32
CYP2C9 P11712 1/20 0.32
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1115989 0.89
SCHEMBL16637481 0.89
SCHEMBL11945787 0.82 SHBG (0.41) SHBGTSHR
SCHEMBL11945786 0.82 SHBG (0.41) SHBGTSHR
SCHEMBL18031544 0.82 SHBG (0.41) SHBGTSHR
SCHEMBL17008873 0.79
SCHEMBL14623174 0.79
SCHEMBL1355932 0.79
SCHEMBL31356265 0.78 SMYD3 (0.30)
SCHEMBL19945247 0.78 SHBG (0.33) SHBG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0297614-B1 Improved process for the preparation of organopolysiloxane surfactants OSI SPECIALTIES INC (US) 1995-02-08 EP claimed
EP-0297614-B1 Improved process for the preparation of organopolysiloxane surfactants OSI SPECIALTIES INC (US) 1995-02-08 EP disclosed
US-4857583-A POLYETHERSILOXANE BLOCK POLYMER UNION CARBIDE CORPORATION (US) 1989-08-15 US disclosed
US-4268611-A Contact photographic process for producing a planographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1981-05-19 US disclosed
US-4168979-A Light-sensitive printing plate with matt overlayer FUJI PHOTO FILM CO., LTD. (JP) 1979-09-25 US disclosed
US-4131465-A Radiation sensitive polymeric o-nitrophenyl acetals and element EASTMAN KODAK COMPANY (US) 1978-12-26 US disclosed
US-4086210-A Radiation sensitive polymeric o-nitrophenyl acetals EASTMAN KODAK COMPANY (US) 1978-04-25 US disclosed