SCHEMBL915207

SCHEMBL915207

CCOC[CH]CCOC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1019318 0.84 ALDH1A1 (0.39)
SCHEMBL9771895 0.84 ALDH1A1 (0.30)
SCHEMBL7642372 0.82 ALDH1A1 (0.31)
SCHEMBL10413388 0.82 ALDH1A1 (0.31)
SCHEMBL9679541 0.82 ALDH1A1 (0.31)
SCHEMBL8557063 0.82
SCHEMBL5867193 0.80
SCHEMBL10817849 0.79 TSHR (0.38)
SCHEMBL1019544 0.78
SCHEMBL8728592 0.78 PTGS1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108699241-B Polyalkyleneimino polymers with polyester groups 巴斯夫欧洲公司 2022-10-14 CN disclosed
US-10808078-B2 Polyalkylene imine based polymers having polyester groups BASF SE (DE) 2020-10-20 US disclosed
US-20190092903-A1 POLYALKYLENE IMINE BASED POLYMERS HAVING POLYESTER GROUPS BASF SE (DE) 2019-03-28 US disclosed
EP-3417001-A1 POLYALKYLENE IMINE BASED POLYMERS HAVING POLYESTER GROUPS BASF SE (DE) 2018-12-26 EP disclosed
WO-2017140538-A1 POLYALKYLENE IMINE BASED POLYMERS HAVING POLYESTER GROUPS BASF SE (DE) 2017-08-24 WO disclosed
CN-105102533-A Contact member and structure comprising same TECHNO POLYMER CO LTD 2015-11-25 CN disclosed
US-7871748-B2 Iron containing hole blocking layer containing photoconductors XEROX CORPORATION (US) 2011-01-18 US disclosed
US-20090035673-A1 IRON CONTAINING HOLE BLOCKING LAYER CONTAINING PHOTOCONDUCTORS XEROX CORPORATION (US) 2009-02-05 US disclosed
US-4941909-A HERBICIDES, PYRIMIDONE BENZOATES HOFFMANN-LA ROCHE INC. (US) 1990-07-17 US disclosed
US-4427753-A Electrophotographic photosensitive member with disazo or trisazo compound CANON KABUSHIKI KAISHA (JP) 1984-01-24 US disclosed
US-4371609-A Forming method of a dye image KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1983-02-01 US disclosed
US-4241079-A ANTHELMINTICS AND FUNGICIDES ROHM AND HAAS COMPANY (US) 1980-12-23 US disclosed
US-3980677-A Anthraquinone dyestuffs containing sulphonic acid groups BAYER AKTIENGESELLSCHAFT (DT) 1976-09-14 US disclosed