SCHEMBL915584

SCHEMBL915584

O=C(O)c1ccc(C(=O)O)c(CP(=O)(O)O)c1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 2/20 0.44
▸ TSHR P16473 3/20 0.42
▸ PGK1 P00558 1/20 0.41
▸ PGK2 P07205 1/20 0.41
▸ MYC P01106 1/20 0.41
▸ NEU3 Q9UQ49 1/20 0.40
▸ PTPN1 P18031 1/20 0.40
▸ CA12 O43570 1/20 0.39
▸ CA1 P00915 1/20 0.39
▸ CA2 P00918 1/20 0.39
▸ POLB P06746 1/20 0.39
▸ GAA P10253 1/20 0.39
▸ MAPT P10636 1/20 0.39
▸ CA4 P22748 1/20 0.39
▸ CA6 P23280 1/20 0.39
▸ PTGS2 P35354 1/20 0.39
▸ CA7 P43166 1/20 0.39
▸ CA9 Q16790 1/20 0.39
▸ CA14 Q9ULX7 1/20 0.39
▸ L3MBTL1 Q9Y468 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL914185 0.80 TSHR (0.41) KDM4ETSHRMYCCA12CA1
SCHEMBL2707156 0.80 KDM4E (0.44) KDM4ETSHRMYCNEU3PTPN1
SCHEMBL28422098 0.78 KDM4E (0.52) KDM4ETSHRMYCPTPN1CA12
SCHEMBL8579535 0.78 KDM4E (0.57) KDM4ETSHRMYCPTPN1CA12
SCHEMBL913957 0.77 MAPT (0.43) KDM4ETSHRMYCCA12CA1
SCHEMBL916860 0.77 FOLH1 (0.53) KDM4ETSHRCA12CA1CA2
SCHEMBL1408523 0.76 KDM4E (0.50) KDM4ETSHRMYCPTPN1CA12
Phosphoric Acid SCHEMBL5357203 0.76 KDM4E (0.60) KDM4ETSHRMYCPTPN1CA12
SCHEMBL277909 0.76 ALDH1A1 (0.54) KDM4ETSHRMYCPTPN1CA12
SCHEMBL8481670 0.76 KDM4E (0.50) KDM4ETSHRMYCPTPN1CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 — — US disclosed
CN-101208371-B Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI 2011-08-10 — — CN disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 — — US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 — — EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 — — US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 — — US disclosed
CN-101263175-A Polyester, process for production of polyester, and polyester molded article TOYO BOSEKI (JP) 2008-09-10 — — CN disclosed
CN-101208371-A Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI (JP) 2008-06-25 — — CN disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 — — EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 — — EP disclosed
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