Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.71 |
| ▸ | TSHR | P16473 | 6/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | APEX1 | P27695 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.36 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.36 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | PGR | P06401 | 1/20 | 0.32 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.32 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.32 |
| ▸ | HTR1A | P08908 | 1/20 | 0.32 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.32 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18101452 | 1.00 | THRB (0.71) | THRBTSHRALDH1A1TDP1POLB | |
| SCHEMBL6142874 | 0.97 | THRB (0.74) | THRBTSHRALDH1A1TDP1POLB | |
| SCHEMBL15636 | 0.97 | THRB (0.74) | THRBTSHRALDH1A1TDP1POLB | |
| Ethylene SCHEMBL9301341 | 0.94 | THRB (0.71) | THRBTSHRALDH1A1TDP1POLB | |
| Formaldehyde SCHEMBL10432559 | 0.94 | THRB (0.71) | THRBTSHRALDH1A1TDP1POLB | |
| Ethylene SCHEMBL955493 | 0.94 | THRB (0.71) | THRBTSHRALDH1A1TDP1POLB | |
| Ethylene SCHEMBL478195 | 0.94 | THRB (0.71) | THRBTSHRALDH1A1TDP1POLB | |
| Ethylene SCHEMBL478105 | 0.94 | THRB (0.71) | THRBTSHRALDH1A1TDP1POLB | |
| Ethylene SCHEMBL7157721 | 0.94 | THRB (0.71) | THRBTSHRALDH1A1TDP1POLB | |
| SCHEMBL3286289 | 0.94 | THRB (0.71) | THRBTSHRALDH1A1TDP1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11667564-B2 | Method of manufacturing an etched glass article | AGFA-GEVAERT NV (BE) | 2023-06-06 | — | — | US | disclosed |
| US-11667564-B2 | Method of manufacturing an etched glass article | AGFA-GEVAERT NV (BE) | 2023-06-06 | — | — | US | disclosed |
| EP-3486265-B1 | ACRYLIC RESIN POWDER AND RESIN COMPOSITION FOR HOT MELT ADHESIVES, AND METHOD FOR PRODUCING SAME | MITSUBISHI CHEM CORP (JP) | 2022-06-01 | — | — | EP | disclosed |
| US-11124587-B2 | Acrylic resin powder and resin composition for hot melt adhesives, and method of producing same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2021-09-21 | — | — | US | disclosed |
| US-20210017068-A1 | METHOD OF MANUFACTURING AN ETCHED GLASS ARTICLE | AGFA-GEVAERT NV (BE) | 2021-01-21 | — | — | US | disclosed |
| US-10662532-B2 | Methods of manufacturing embossing elements | AGFA-GEVAERT N.V. (BE) | 2020-05-26 | — | — | US | disclosed |
| US-10655027-B2 | Free radical radiation curable liquids for de-inking substrates | AGFA GEVAERT NV (BE) | 2020-05-19 | — | — | US | disclosed |
| EP-3201278-B1 | METHODS OF MANUFACTURING EMBOSSING ELEMENTS | AGFA NV (BE) | 2019-10-09 | — | — | EP | disclosed |
| US-20190233562-A1 | ACRYLIC RESIN POWDER AND RESIN COMPOSITION FOR HOT MELT ADHESIVES, AND METHOD OF PRODUCING SAME | MITSUBISHI CHEMICAL CORPORATION (JP) | 2019-08-01 | — | — | US | disclosed |
| EP-3486265-A1 | ACRYLIC RESIN POWDER AND RESIN COMPOSITION FOR HOT MELT ADHESIVES, AND METHOD FOR PRODUCING SAME | Mitsubishi Chemical Corporation (JP) | 2019-05-22 | — | — | EP | disclosed |
| US-9120965-B2 | Composition and method for recovering hydrocarbon fluids from a subterranean reservoir | NALCO COMPANY (US) | 2015-09-01 | — | — | US | disclosed |
| US-20150210870-A1 | RECYCLING OF RADIATION CURED PRINTED MATTER | AGFA NV (BE) | 2015-07-30 | — | — | US | disclosed |
| US-20150210870-A1 | RECYCLING OF RADIATION CURED PRINTED MATTER | AGFA NV (BE) | 2015-07-30 | — | — | US | disclosed |
| US-20150210875-A1 | FREE RADICAL RADIATION CURABLE LIQUIDS FOR DE-INKING SUBSTRATES | AGFA GEVAERT NV (BE) | 2015-07-30 | — | — | US | disclosed |
| US-20150210875-A1 | FREE RADICAL RADIATION CURABLE LIQUIDS FOR DE-INKING SUBSTRATES | AGFA GEVAERT NV (BE) | 2015-07-30 | — | — | US | disclosed |
| WO-2015086659-A1 | A LITHOGRAPHIC PRINTING PLATE PRECURSOR AND MONOMER | AGFA GRAPHICS NV (BE) | 2015-06-18 | — | — | WO | disclosed |
| EP-2883699-A1 | A lithographic printing plate precursor and monomer | AGFA GRAPHICS NV (BE) | 2015-06-17 | — | — | EP | disclosed |
| EP-0353030-B1 | Photopolymerization initiator and photosensitive composition employing the same | CANON KK (JP) | 1995-03-15 | — | — | EP | disclosed |
| US-5124235-A | Photopolymerization initiator and photosensitive composition employing the same | CANON KABUSHIKI KAISHA (JP) | 1992-06-23 | — | — | US | disclosed |
| EP-0353030-A2 | Photopolymerization initiator and photosensitive composition employing the same | CANON KABUSHIKI KAISHA (JP) | 1990-01-31 | — | — | EP | disclosed |