SCHEMBL916598

SCHEMBL916598

CO[PH](=O)c1ccccc1-c1ccc(O)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ABL1 P00519 2/20 0.47
ABCB1 P08183 2/20 0.47
BCR P11274 2/20 0.47
ESR2 Q92731 2/20 0.40
MGAM O43451 3/20 0.39
GAA P10253 3/20 0.39
SI P14410 3/20 0.39
MGAM2 Q2M2H8 3/20 0.39
HDAC4 P56524 1/20 0.39
HDAC2 Q92769 1/20 0.39
HDAC8 Q9BY41 1/20 0.39
BACE1 P56817 3/20 0.38
PDE4A P27815 2/20 0.38
PDE4B Q07343 2/20 0.38
PDE4C Q08493 2/20 0.38
PDE4D Q08499 2/20 0.38
HSP90AA1 P07900 1/20 0.38
MMP3 P08254 1/20 0.38
BCL2L1 Q07817 1/20 0.38
PTPN1 P18031 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL471981 0.84 SYK (0.39) KMT2AMEN1KDM4EALDH1A1LMNA
SCHEMBL15303695 0.81 EGFR (0.51) PTPN1KDM4EALDH1A1MAPTHPGD
SCHEMBL914029 0.80 ABL1 (0.41) ABL1ABCB1BCRESR2HDAC4
SCHEMBL23114236 0.79 TSHR (0.41) ESR2GAABCL2L1PTPN1KMT2A
SCHEMBL916574 0.78 ABL1 (0.48) ABL1ABCB1BCRESR2GAA
SCHEMBL11649447 0.74 CA2 (0.46) ESR2GAAKMT2AMEN1KDM4E
SCHEMBL472002 0.73 BRD4 (0.36) KMT2AMEN1KDM4EALDH1A1LMNA
SCHEMBL28901712 0.72 ESR2 (0.48) ABL1ABCB1BCRESR2MMP3
SCHEMBL29810161 0.72 ABL1 (0.59) ABL1ABCB1BCRESR2MGAM
SCHEMBL18593394 0.72 ABL1 (0.59) ABL1ABCB1BCRESR2MGAM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-12384893-B2 Biaxially oriented polyester film TOYOBO CO., LTD. (JP) 2025-08-12 US disclosed
US-20250122344-A1 POLYESTER RESIN TOYOBO CO., LTD. (JP) 2025-04-17 US disclosed
EP-3925758-B1 BIAXIALLY STRETCHED POLYESTER FILM TOYO BOSEKI (JP) 2024-12-11 EP disclosed
EP-3928956-B1 BIAXIALLY STRETCHED POLYESTER FILM ROLL TOYO BOSEKI (JP) 2024-10-09 EP disclosed
WO-2024166618-A1 METHOD FOR PRODUCING COPOLYMER POLYESTER RESIN 東洋紡エムシー株式会社 2024-08-15 WO disclosed
US-12059831-B2 Biaxially oriented polyester film roll TOYOBO CO., LTD. (JP) 2024-08-13 US disclosed
EP-4410861-A1 POLYESTER RESIN Toyobo Co., Ltd. (JP) 2024-08-07 EP disclosed
US-20240117107-A1 POLYESTER RESIN TOYOBO MC CORPORATION (JP) 2024-04-11 US disclosed
WO-2024070037-A1 CO-POLYESTER RESIN 東洋紡エムシー株式会社 2024-04-04 WO disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed
US-20070106055-A1 Polyester polymerization catalyst, polyester produced therewith and process for producing the polyester TOYO BOSEKI KABUSHIKI KAISHA (JP) 2007-05-10 US disclosed
US-20070065649-A1 Polyester resin TOYO BOSEKI KAUSHIKI KAISHA (JP) 2007-03-22 US disclosed
EP-1719790-A1 POLYESTER POLYMERIZATION CATALYST, POLYESTER PRODUCED THEREWITH AND PROCESS FOR PRODUCING THE POLYESTER Toyo Boseki Kabushiki Kaisha (JP) 2006-11-08 EP disclosed
US-6346574-B1 Fire retardance-imparting additive ASAHI KASEI KABUSHIKI KAISHA (JP) 2002-02-12 US disclosed
US-6093760-A LOW VOLATILITY FLAME RETARDANT FOR A STYRENE RESIN COMPRISING HYDROGEN OR HALOGEN OR HALOGEN-FREE 1-30 CARBON ATOMS SUBSTITUTED TRIPHENYLPHOSPHATE, WHERE THE SUBSTITUENTS IN EACH PHENYL ARE DIFFERENT ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 2000-07-25 US disclosed
EP-0813571-A1 FLAME RETARDANT FOR STYRENE RESIN AND RESIN COMPOSITION COMPRISING THE SAME Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1997-12-29 EP disclosed
WO-1996027637-A1 FLAME RETARDANT FOR STYRENE RESIN AND RESIN COMPOSITION COMPRISING THE SAME ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1996-09-12 WO disclosed
US-4632946-A BLEND WITH PHENOLIC RESIN, NITROGEN CONTAINING COMPOUND, AND PHOSPHORUS CONTAINING COMPOUND BASF AKTIENGESELLSCHAFT (DE) 1986-12-30 US disclosed