SCHEMBL916643

SCHEMBL916643

CCOP(=O)(Cc1c2ccccc2cc2ccccc12)OCC

nearest known ligand 0.52

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
NR1I2 O75469 1/20 0.52
KDM4E B2RXH2 2/20 0.46
HPGD P15428 2/20 0.46
LMNA P02545 1/20 0.46
L3MBTL1 Q9Y468 2/20 0.43
HTR2A P28223 1/20 0.43
NPY5R Q15761 1/20 0.41
GPR84 Q9NQS5 1/20 0.40
NPSR1 Q6W5P4 2/20 0.39
KCNH2 Q12809 1/20 0.38
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
TSHR P16473 1/20 0.36
MAPT P10636 1/20 0.36
ALDH1A1 P00352 1/20 0.36
THRB P10828 1/20 0.36
POLB P06746 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1305525 0.88 KDM4E (0.45) NR1I2KDM4EHPGDLMNANPY5R
SCHEMBL914661 0.85 NR1I2 (0.55) NR1I2KDM4EHPGDLMNAL3MBTL1
SCHEMBL8824524 0.83 HTR2A (0.46) NR1I2KDM4EHPGDLMNAL3MBTL1
SCHEMBL915276 0.83 NR1I2 (0.49) NR1I2KDM4EHPGDLMNAL3MBTL1
SCHEMBL18486625 0.82 NR1I2 (0.43) NR1I2KDM4EHPGDLMNANPY5R
SCHEMBL13387363 0.82 NPY5R (0.52) NR1I2KDM4EHPGDLMNAL3MBTL1
SCHEMBL1294329 0.81 NR1I2 (0.47) NR1I2KDM4EHPGDLMNANPY5R
SCHEMBL27974807 0.80 NR1I2 (0.49) NR1I2KDM4EHPGDLMNAHTR2A
SCHEMBL6305102 0.79 KDM4E (0.41) NR1I2KDM4EHPGDLMNANPY5R
SCHEMBL914842 0.78 WDR5 (0.46) NR1I2KDM4EHPGDLMNAL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-9640689-B2 Polyester film for the protection of back surfaces of solar cells TOYO BOSEKI KABUSHIKI KAISHA (JP) 2017-05-02 US disclosed
US-9640689-B2 Polyester film for the protection of back surfaces of solar cells TOYO BOSEKI KABUSHIKI KAISHA (JP) 2017-05-02 US disclosed
US-20120183761-A1 POLYESTER FILM FOR THE PROTECTION OF BACK SURFACES OF SOLAR CELLS TOYO BOSEKI KABUSHIKI KAISHA (JP) 2012-07-19 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090297752-A1 POLYESTER RESIN, POLYESTER RESIN COMPOSITION THEREFROM AND USE THEREOF TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-12-03 US disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed
US-20070106055-A1 Polyester polymerization catalyst, polyester produced therewith and process for producing the polyester TOYO BOSEKI KABUSHIKI KAISHA (JP) 2007-05-10 US disclosed
US-20070106055-A1 Polyester polymerization catalyst, polyester produced therewith and process for producing the polyester TOYO BOSEKI KABUSHIKI KAISHA (JP) 2007-05-10 US disclosed
US-4091208-A ELECTROGRAPHY, PHOTOSENSITIVITY RICOH CO., LTD. (JA) 1978-05-23 US disclosed