SCHEMBL9178128

SCHEMBL9178128

CC(C)(C)OC(=O)Oc1ccc(COC(OCc2ccc(OC(=O)OC(C)(C)C)cc2)c2ccc(OC(=O)OC(C)(C)C)cc2)cc1

nearest known ligand 0.53

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ELANE P08246 3/20 0.53
KDM1A O60341 1/20 0.40
HTR2A P28223 1/20 0.37
RXRA P19793 2/20 0.37
RXRB P28702 2/20 0.37
PPARG P37231 2/20 0.35
PPARA Q07869 1/20 0.35
CA2 P00918 1/20 0.35
ESR1 P03372 1/20 0.35
HIF1A Q16665 1/20 0.35
FFAR1 O14842 3/20 0.34
NR4A2 P43354 1/20 0.34
PTGS2 P35354 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9176375 0.84 ELANE (0.54) ELANEKDM1ACA2ESR1HIF1A
SCHEMBL9179232 0.82 ELANE (0.55) ELANEKDM1AESR1HIF1A
SCHEMBL8781783 0.80 ELANE (0.60) ELANEKDM1ACA2ESR1HIF1A
SCHEMBL197026 0.79 ELANE (0.55) ELANEKDM1AHTR2APPARGPPARA
SCHEMBL196293 0.78 ELANE (0.66) ELANEKDM1APPARGPPARACA2
SCHEMBL197179 0.78 ELANE (0.66) ELANEKDM1ACA2ESR1HIF1A
SCHEMBL9171373 0.78 ELANE (0.57) ELANEKDM1ACA2ESR1HIF1A
SCHEMBL9178617 0.78 ELANE (0.47) ELANEPPARGPPARAESR1
SCHEMBL4061370 0.78 ELANE (0.81) ELANEKDM1ACA2
SCHEMBL4056333 0.77 ELANE (0.64) ELANEKDM1ARXRARXRBCA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0525626-B1 Compounds containing acid-cleavable protective groups and positive-working radiation-sensitive compositions prepared using these compounds HOECHST AG (DE) 1995-06-14 EP disclosed
US-5356752-A Compounds with acid-labile protective groups useful in positive-working radiation-sensitive mixtures HOECHST AKTIENGESELLSCHAFT (DE) 1994-10-18 US disclosed
EP-0525626-A1 Compounds containing acid-cleavable protective groups and positive-working radiation-sensitive compositions prepared using these compounds HOECHST AKTIENGESELLSCHAFT (DE) 1993-02-03 EP disclosed