⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3134205 | 0.89 | ALDH1A1 (0.43) | — | |
| SCHEMBL2184 | 0.89 | — | — | |
| SCHEMBL7132094 | 0.80 | — | — | |
| SCHEMBL6763266 | 0.80 | — | — | |
| SCHEMBL6926611 | 0.80 | — | — | |
| Iodide SCHEMBL25277006 | 0.80 | — | — | |
| SCHEMBL8468539 | 0.80 | — | — | |
| SCHEMBL2897596 | 0.80 | — | — | |
| Ammonia Solution, Strong SCHEMBL925673 | 0.80 | — | — | |
| SCHEMBL10826384 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0528540-B1 | Thin-film coatings made by means of plasma-activated chemical vapor deposition of fluorinated cyclic siloxanes | DOW CORNING (US) | 1995-08-30 | — | — | EP | disclosed |
| US-5334454-A | Protective, dielectric coatings | DOW CORNING CORPORATION (US) | 1994-08-02 | — | — | US | disclosed |
| US-5230929-A | Thin film | DOW CORNING CORPORATION (US) | 1993-07-27 | — | — | US | disclosed |
| EP-0528540-A2 | Thin-film coatings made by means of plasma-activated chemical vapor deposition of fluorinated cyclic siloxanes | DOW CORNING CORPORATION (US) | 1993-02-24 | — | — | EP | disclosed |