SCHEMBL919515

SCHEMBL919515

CCOOC(=O)OOCC

nearest known ligand 0.47

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.47
SOAT1 P35610 1/20 0.43
LMNA P02545 1/20 0.38
HSD17B10 Q99714 1/20 0.38
ALOX15 P16050 1/20 0.36
MGAM O43451 1/20 0.36
GAA P10253 1/20 0.36
SI P14410 1/20 0.36
MGAM2 Q2M2H8 1/20 0.36
TRPA1 O75762 1/20 0.33
TDP1 Q9NUW8 2/20 0.32
FFAR3 O14843 1/20 0.32
TSHR P16473 1/20 0.31
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8747973 0.97 ALDH1A1 (0.45) ALDH1A1SOAT1LMNAHSD17B10ALOX15
SCHEMBL7768656 0.89
SCHEMBL11451596 0.88 SOAT1 (0.52) ALDH1A1SOAT1LMNAHSD17B10ALOX15
SCHEMBL28897029 0.87 ALDH1A1 (0.57) ALDH1A1SOAT1LMNAHSD17B10ALOX15
SCHEMBL809407 0.85
SCHEMBL7255546 0.83 ALDH1A1 (0.60) ALDH1A1SOAT1LMNAHSD17B10ALOX15
SCHEMBL544740 0.83 ALDH1A1 (0.60) ALDH1A1SOAT1LMNAHSD17B10ALOX15
SCHEMBL13294445 0.83
SCHEMBL7137970 0.83 TSHR (0.35) ALDH1A1SOAT1HSD17B10TDP1TSHR
SCHEMBL809408 0.81 ALDH1A1 (0.43) ALDH1A1SOAT1LMNAHSD17B10ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1320686-C Polymer electrolyte and lithium cell using same SAMSUNG SDI CO LTD (KR) 2007-06-06 CN claimed
CN-1438727-A Polymer electrolyte and lithium cell using same SAMSUNG SDI CO LTD (KR) 2003-08-27 CN claimed
CN-115340491-B Electrostatic-hydrogen bond chelating ionic liquid and preparation method and application thereof 井冈山大学 2023-08-01 CN disclosed
CN-115340491-A Electrostatic-hydrogen bond chelating ionic liquid and preparation method and application thereof 井冈山大学 2022-11-15 CN disclosed
CN-111823469-B Microwave electromagnetic heating foaming forming process, applicable mold and foaming material 正合林兴业股份有限公司 2022-06-17 CN disclosed
CN-109422898-A Foaming agent comprising tertiary ammonium salt and ethanolamine salt and the purposes for polyurethane interval plate foam-body material 山东理工大学 2019-03-05 CN disclosed
CN-109422900-A Secondary amine and ethanol amine alkalinity foaming agent and the purposes for being used to prepare polyurethane solar energy foam-body material 山东理工大学 2019-03-05 CN disclosed
CN-109422914-A Polyamines ethanol amine alkalinity foaming agent and the purposes for being used to prepare polyurethane solar energy foam-body material 补天新材料技术有限公司 2019-03-05 CN disclosed
CN-109422916-A Foaming agent comprising secondary amine salt and ethanolamine salt and the purposes for polyurethane interval plate foam-body material 山东理工大学 2019-03-05 CN disclosed
CN-109422859-A Orthoformic acid alcohol amine salt and carbonic acid ethanol amine alkalinity foaming agent and the purposes for being used to prepare polyurethane solar energy foam-body material 补天新材料技术有限公司 2019-03-05 CN disclosed
CN-109422905-A Tertiary amine and ethanol amine alkalinity foaming agent and the purposes for being used to prepare polyurethane solar energy foam-body material 山东理工大学 2019-03-05 CN disclosed
WO-2003063872-A1 NON-SEDATING BARBITURIC ACID DERIVATIVES TARO PHARMACEUTICAL INDUSTRIES LTD. (IL) 2003-08-07 WO disclosed
US-6541597-B2 Resist resin having in its structure a bridged bond containing aliphatic ring; pattern excellent in transparency against short wavelength light and dry-etching resistance can be formed by alkali development with high resolution. KABUSHIKI KAISHA TOSHIBA (JP) 2003-04-01 US disclosed
US-20030022102-A1 Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite member KABUSHIKI KAISHA TOSHIBA (JP) 2003-01-30 US disclosed
US-20020098441-A1 Resin useful for resist, resist composition and pattern forming process using the same KABUSHIKI KAISHA TOSHIBA (JP) 2002-07-25 US disclosed
US-6303266-B1 FOR PATTERN HAVING TRANSPARENCY AGAINST SHORT-WAVELENGTH LIGHT AND DRY-ETCHING RESISTANCE CAN BE FORMED BY ALKALI DEVELOPMENT WITH HIGH RESOLUTION KABUSHIKI KAISHA TOSHIBA (JP) 2001-10-16 US disclosed
US-5756254-A CONTAINING PHOTOSENSITIVE ACID GENERATOR KABUSHIKI KAISHA TOSHIBA (JP) 1998-05-26 US disclosed
US-5750766-A Process for the preparation of arylmalonates AMERICAN CYANAMID COMPANY (US) 1998-05-12 US disclosed
EP-0082266-B1 SUBSTITUTED 1,5-DIAMINOPENTANES, THEIR PREPARATION AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM BASF Aktiengesellschaft (DE) 1985-01-09 EP disclosed
EP-0082266-A1 Substituted 1,5-diaminopentanes, their preparation and pharmaceutical compositions containing them BASF Aktiengesellschaft (DE) 1983-06-29 EP disclosed