SCHEMBL919670

SCHEMBL919670

CC(C)(C)OC(=O)Oc1ccc(-c2ccc(-c3cc(-c4ccc(-c5ccc(OC(=O)OC(C)(C)C)cc5)cc4)cc(-c4ccc(-c5ccc(OC(=O)OC(C)(C)C)cc5)cc4)c3)cc2)cc1

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 7/20 0.66
KDM1A O60341 1/20 0.48
CA2 P00918 2/20 0.44
HSD17B10 Q99714 1/20 0.41
NR1H2 P55055 1/20 0.39
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39
KIF11 P52732 1/20 0.39
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA9 Q16790 1/20 0.38
CA14 Q9ULX7 1/20 0.38
LMNA P02545 1/20 0.38
GAA P10253 1/20 0.38
MAPKAPK2 P49137 1/20 0.36
NPC1 O15118 1/20 0.36
TP53 P04637 1/20 0.36
MAPK1 P28482 1/20 0.36
CASP3 P42574 1/20 0.36
RAB9A P51151 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL978959 1.00 ELANE (0.66) ELANEKDM1ACA2HSD17B10NR1H2
SCHEMBL4059798 0.94 ELANE (0.72) ELANEKDM1ACA2HSD17B10NR1H2
SCHEMBL13616226 0.93 ELANE (0.58) ELANEKDM1ACA2MEN1KMT2A
SCHEMBL4061370 0.88 ELANE (0.81) ELANEKDM1ACA2MEN1KMT2A
SCHEMBL4060624 0.87 ELANE (0.64) ELANEKDM1ACA2HSD17B10MEN1
SCHEMBL12240209 0.86 ELANE (0.62) ELANEKDM1ACA2HSD17B10NR1H2
SCHEMBL3985477 0.86 ELANE (0.62) ELANEKDM1ACA2HSD17B10MEN1
SCHEMBL14878467 0.86 ELANE (0.62) ELANEKDM1ACA2HSD17B10NR1H2
SCHEMBL7705585 0.84 ELANE (0.60) ELANEKDM1ACA2HSD17B10NR1H2
SCHEMBL28961521 0.83 ELANE (0.68) ELANEKDM1ACA2HSD17B10MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7871755-B2 Photosensitive composition KABUSHIKI KAISHA TOSHIBA (JP) 2011-01-18 US disclosed
US-7871755-B2 Photosensitive composition KABUSHIKI KAISHA TOSHIBA (JP) 2011-01-18 US disclosed
US-7871755-B2 Photosensitive composition KABUSHIKI KAISHA TOSHIBA (JP) 2011-01-18 US disclosed
US-20090081582-A1 irradiating a predetermined region of photosensitive layer, subjecting the photosensitive layer after baking to development treatment with an alkali aqueous solution to selectively remove the light-exposed part; has a photo-acid generator which generates an acid by the action of actinic radiation KABUSHIKI KAISHA TOSHIBA 2009-03-26 US disclosed
US-20090081582-A1 irradiating a predetermined region of photosensitive layer, subjecting the photosensitive layer after baking to development treatment with an alkali aqueous solution to selectively remove the light-exposed part; has a photo-acid generator which generates an acid by the action of actinic radiation KABUSHIKI KAISHA TOSHIBA 2009-03-26 US disclosed
US-20090081582-A1 irradiating a predetermined region of photosensitive layer, subjecting the photosensitive layer after baking to development treatment with an alkali aqueous solution to selectively remove the light-exposed part; has a photo-acid generator which generates an acid by the action of actinic radiation KABUSHIKI KAISHA TOSHIBA 2009-03-26 US disclosed