Ethylene

Ethylene

SCHEMBL9212488

C=C.C=C.C=C.O[SiH3]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL7624355 1.00
SCHEMBL8969621 0.78
SCHEMBL397781 0.78
SCHEMBL18357 0.78
SCHEMBL2554735 0.78
Formaldehyde SCHEMBL5803291 0.73
SCHEMBL5025861 0.67
SCHEMBL3239793 0.67
SCHEMBL7880376 0.67
SCHEMBL1657682 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0350531-B1 Dopant film and methods of diffusing impurity into and manufacturing a semiconductor wafer TOSHIBA KK (JP) 1995-01-25 EP disclosed
US-5094976-A Coating dopant film with adhesive, releasable sheets, automatic stacking KABUSHIKI KAISHA TOSHIBA (JP) 1992-03-10 US disclosed
US-5073517-A Dividing the wafer into two halves in direction of thickness after doping KABUSHIKI KAISHA TOSHIBA (JP) 1991-12-17 US disclosed
US-5024867-A Releasable sheets sandwiching film containing organic or inorganic binders with adhesive layers interposed between KABUSHIKI KAISHA TOSHIBA (JP) 1991-06-18 US disclosed
EP-0350531-A2 Dopant film and methods of diffusing impurity into and manufacturing a semiconductor wafer KABUSHIKI KAISHA TOSHIBA (JP) 1990-01-17 EP disclosed