Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL818593 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL4467443 | 0.65 | — | — | |
| SCHEMBL4576179 | 0.64 | — | — | |
| Bromide SCHEMBL7883977 | 0.64 | — | — | |
| SCHEMBL1364196 | 0.57 | — | — | |
| Hydrochloric Acid SCHEMBL10790772 | 0.57 | — | — | |
| Hydrochloric Acid SCHEMBL8014829 | 0.55 | — | — | |
| Hydrochloric Acid SCHEMBL9357204 | 0.55 | — | — | |
| Hydrochloric Acid SCHEMBL17529926 | 0.55 | — | — | |
| Hydrochloric Acid SCHEMBL7063112 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0283164-B1 | Cyclo-olefinic random copolymer, olefinic random copolymer, and process for producing cyclo-olefinic random copolymers | MITSUI PETROCHEMICAL IND (JP) | 1995-05-24 | — | — | EP | disclosed |
| US-5008356-A | Copolymerization using coordination catalysts | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1991-04-16 | — | — | US | disclosed |
| US-5003019-A | Radiation transparent, heat resistant, solvent resistant copolymer | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1991-03-26 | — | — | US | disclosed |