SCHEMBL9225946

SCHEMBL9225946

CC(=O)NCC[Si](C)(C)C

nearest known ligand 0.55

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.55
MAPK1 P28482 1/20 0.55
HIF1A Q16665 1/20 0.55
TSHR P16473 1/20 0.50
ALDH1A1 P00352 1/20 0.48
PAOX Q6QHF9 3/20 0.44
ADRA1A P35348 1/20 0.43
F13A1 P00488 1/20 0.39
QPCT Q16769 1/20 0.38
QPCTL Q9NXS2 1/20 0.38
MTNR1A P48039 5/20 0.38
MTNR1B P49286 5/20 0.38
NPSR1 Q6W5P4 2/20 0.37
SMN1; SMN2 Q16637 2/20 0.36
L3MBTL1 Q9Y468 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5482204 0.80 KDM4E (0.73) KDM4EMAPK1HIF1ATSHRALDH1A1
SCHEMBL8107 0.78 KDM4E (0.71) KDM4EMAPK1HIF1ATSHRALDH1A1
SCHEMBL1216700 0.78 CYP2D6 (0.40) KDM4EMAPK1HIF1ATSHRALDH1A1
SCHEMBL27043265 0.77 KDM4E (0.54) KDM4EMAPK1HIF1ATSHRALDH1A1
SCHEMBL10596212 0.77 TSHR (0.75) KDM4EMAPK1HIF1ATSHRALDH1A1
SCHEMBL14441639 0.74
SCHEMBL12891506 0.74 KDM4E (0.64) KDM4EMAPK1HIF1ATSHRALDH1A1
SCHEMBL860791 0.73 KDM4E (0.94) KDM4EMAPK1HIF1ATSHRALDH1A1
SCHEMBL1900471 0.73 KDM4E (0.82) KDM4EMAPK1HIF1ATSHRALDH1A1
SCHEMBL31565700 0.72 KDM4E (0.48) KDM4EMAPK1HIF1ATSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0378430-B1 Novel organosilicon compound and process for producing organosilicon compound AGENCY IND SCIENCE TECHN (JP) 1995-02-01 EP disclosed
US-5151538-A ORGANOSILICON COMPOUND AND PROCESS FOR PRODUCING ORGANOSILICON COMPOUND AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 1992-09-29 US disclosed